JPH0120732B2 - - Google Patents

Info

Publication number: JPH0120732B2
Authority: JP; Japan
Prior art keywords: photosensitive; polymer; acid; soluble; group
Prior art date: 1980-02-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP2475680A

Other languages

English (en)

Japanese (ja)

Other versions

JPS56122029A (en

Inventor

Koichiro Arita

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Daicel Corp

Original Assignee

Daicel Chemical Industries Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1980-02-29

Filing date

1980-02-29

Publication date

1989-04-18

1980-02-29 Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd

1980-02-29 Priority to JP2475680A priority Critical patent/JPS56122029A/ja

1981-09-25 Publication of JPS56122029A publication Critical patent/JPS56122029A/ja

1989-04-18 Publication of JPH0120732B2 publication Critical patent/JPH0120732B2/ja

Status Granted legal-status Critical Current

Links

229920000642 polymer Polymers 0.000 claims description 29
-1 ester compound Chemical class 0.000 claims description 13
239000007864 aqueous solution Substances 0.000 claims description 12
230000032050 esterification Effects 0.000 claims description 12
238000005886 esterification reaction Methods 0.000 claims description 12
125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
150000001875 compounds Chemical class 0.000 claims description 10
239000003960 organic solvent Substances 0.000 claims description 10
239000002253 acid Substances 0.000 claims description 9
239000000203 mixture Substances 0.000 claims description 9
239000011342 resin composition Substances 0.000 claims description 9
239000012670 alkaline solution Substances 0.000 claims description 7
WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 claims description 7
WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 claims description 5
229930016911 cinnamic acid Natural products 0.000 claims description 5
235000013985 cinnamic acid Nutrition 0.000 claims description 5
WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 claims description 4
FEIQOMCWGDNMHM-KBXRYBNXSA-N (2e,4e)-5-phenylpenta-2,4-dienoic acid Chemical compound OC(=O)\C=C\C=C\C1=CC=CC=C1 FEIQOMCWGDNMHM-KBXRYBNXSA-N 0.000 claims description 3
FEIQOMCWGDNMHM-UHFFFAOYSA-N cinnamylideneacetic acid Natural products OC(=O)C=CC=CC1=CC=CC=C1 FEIQOMCWGDNMHM-UHFFFAOYSA-N 0.000 claims description 3
125000004093 cyano group Chemical group *C#N 0.000 claims description 3
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
125000001424 substituent group Chemical group 0.000 claims description 3
ZCJLOOJRNPHKAV-ONEGZZNKSA-N (e)-3-(furan-2-yl)prop-2-enoic acid Chemical compound OC(=O)\C=C\C1=CC=CO1 ZCJLOOJRNPHKAV-ONEGZZNKSA-N 0.000 claims description 2
239000000243 solution Substances 0.000 description 14
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
238000000034 method Methods 0.000 description 9
229920005989 resin Polymers 0.000 description 9
239000011347 resin Substances 0.000 description 9
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
238000006243 chemical reaction Methods 0.000 description 7
238000000576 coating method Methods 0.000 description 7
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
239000011248 coating agent Substances 0.000 description 6
150000002148 esters Chemical class 0.000 description 6
239000000463 material Substances 0.000 description 6
206010034972 Photosensitivity reaction Diseases 0.000 description 4
239000003513 alkali Substances 0.000 description 4
239000007788 liquid Substances 0.000 description 4
230000036211 photosensitivity Effects 0.000 description 4
239000003504 photosensitizing agent Substances 0.000 description 4
RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 3
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
239000008346 aqueous phase Substances 0.000 description 3
229920001577 copolymer Polymers 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
229910052751 metal Inorganic materials 0.000 description 3
239000002184 metal Substances 0.000 description 3
229920003986 novolac Polymers 0.000 description 3
229920001568 phenolic resin Polymers 0.000 description 3
239000000049 pigment Substances 0.000 description 3
239000002904 solvent Substances 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
229910052725 zinc Inorganic materials 0.000 description 3
239000011701 zinc Substances 0.000 description 3
KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
239000001913 cellulose Substances 0.000 description 2
229920002678 cellulose Polymers 0.000 description 2
229920002301 cellulose acetate Polymers 0.000 description 2
239000000975 dye Substances 0.000 description 2
FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
229910052753 mercury Inorganic materials 0.000 description 2
239000011259 mixed solution Substances 0.000 description 2
239000010680 novolac-type phenolic resin Substances 0.000 description 2
239000005011 phenolic resin Substances 0.000 description 2
WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 2
238000000016 photochemical curing Methods 0.000 description 2
239000000047 product Substances 0.000 description 2
239000007787 solid Substances 0.000 description 2
238000003756 stirring Methods 0.000 description 2
239000000126 substance Substances 0.000 description 2
LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
SVAQSFQTRCAABT-UHFFFAOYSA-N 2-(furan-2-yl)prop-2-enoyl chloride Chemical compound ClC(=O)C(=C)C1=CC=CO1 SVAQSFQTRCAABT-UHFFFAOYSA-N 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
CUARLQDWYSRQDF-UHFFFAOYSA-N 5-Nitroacenaphthene Chemical compound C1CC2=CC=CC3=C2C1=CC=C3[N+](=O)[O-] CUARLQDWYSRQDF-UHFFFAOYSA-N 0.000 description 1
229920000178 Acrylic resin Polymers 0.000 description 1
239000004925 Acrylic resin Substances 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
239000001856 Ethyl cellulose Substances 0.000 description 1
ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
239000004743 Polypropylene Substances 0.000 description 1
239000004372 Polyvinyl alcohol Substances 0.000 description 1
OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
239000004115 Sodium Silicate Substances 0.000 description 1
229920002125 Sokalan® Polymers 0.000 description 1
229920000147 Styrene maleic anhydride Polymers 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
239000000654 additive Substances 0.000 description 1
230000001476 alcoholic effect Effects 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
125000000129 anionic group Chemical group 0.000 description 1
239000003945 anionic surfactant Substances 0.000 description 1
150000008425 anthrones Chemical class 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
239000006229 carbon black Substances 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
150000001805 chlorine compounds Chemical class 0.000 description 1
229940114081 cinnamate Drugs 0.000 description 1
238000004040 coloring Methods 0.000 description 1
239000002131 composite material Substances 0.000 description 1
238000006482 condensation reaction Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
229930003836 cresol Natural products 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
238000006471 dimerization reaction Methods 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
238000001035 drying Methods 0.000 description 1
238000005530 etching Methods 0.000 description 1
229920001249 ethyl cellulose Polymers 0.000 description 1
235000019325 ethyl cellulose Nutrition 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
238000009472 formulation Methods 0.000 description 1
238000005470 impregnation Methods 0.000 description 1
MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 1
239000011976 maleic acid Substances 0.000 description 1
239000012528 membrane Substances 0.000 description 1
229920000609 methyl cellulose Polymers 0.000 description 1
239000001923 methylcellulose Substances 0.000 description 1
235000010981 methylcellulose Nutrition 0.000 description 1
238000002156 mixing Methods 0.000 description 1
239000003607 modifier Substances 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
150000002828 nitro derivatives Chemical class 0.000 description 1
239000002736 nonionic surfactant Substances 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
230000035699 permeability Effects 0.000 description 1
239000012071 phase Substances 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
239000001007 phthalocyanine dye Substances 0.000 description 1
239000002985 plastic film Substances 0.000 description 1
229920006255 plastic film Polymers 0.000 description 1
239000004584 polyacrylic acid Substances 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
229920006267 polyester film Polymers 0.000 description 1
229920001155 polypropylene Polymers 0.000 description 1
229920002451 polyvinyl alcohol Polymers 0.000 description 1
239000000843 powder Substances 0.000 description 1
125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
239000012429 reaction media Substances 0.000 description 1
230000001235 sensitizing effect Effects 0.000 description 1
239000011734 sodium Substances 0.000 description 1
229910000029 sodium carbonate Inorganic materials 0.000 description 1
235000019795 sodium metasilicate Nutrition 0.000 description 1
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
229910052911 sodium silicate Inorganic materials 0.000 description 1
239000007921 spray Substances 0.000 description 1
239000000758 substrate Substances 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1
230000002194 synthesizing effect Effects 0.000 description 1
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
229940001496 tribasic sodium phosphate Drugs 0.000 description 1
RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
229910052724 xenon Inorganic materials 0.000 description 1
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Phenolic Resins Or Amino Resins (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

JP2475680A 1980-02-29 1980-02-29 Photosensitive resin composition developable with aqueous alkali solution Granted JPS56122029A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP2475680A JPS56122029A (en)	1980-02-29	1980-02-29	Photosensitive resin composition developable with aqueous alkali solution

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2475680A JPS56122029A (en)	1980-02-29	1980-02-29	Photosensitive resin composition developable with aqueous alkali solution

Publications (2)

Publication Number	Publication Date
JPS56122029A JPS56122029A (en)	1981-09-25
JPH0120732B2 true JPH0120732B2 (da)	1989-04-18

Family

ID=12146984

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2475680A Granted JPS56122029A (en)	1980-02-29	1980-02-29	Photosensitive resin composition developable with aqueous alkali solution

Country Status (1)

Country	Link
JP (1)	JPS56122029A (da)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5821735A (ja) *	1981-07-31	1983-02-08	Daicel Chem Ind Ltd	アルカリ現像可能な感光性樹脂組成物
US5712022A (en) *	1992-09-14	1998-01-27	Yoshino Kogyosho Co., Ltd.	Printed thermoplastic resin products and method for printing such products

1980
- 1980-02-29 JP JP2475680A patent/JPS56122029A/ja active Granted

Also Published As

Publication number	Publication date
JPS56122029A (en)	1981-09-25

Publication	Publication Date	Title
JP2582578B2 (ja)	1997-02-19	感光性樹脂組成物
US4308368A (en)	1981-12-29	Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPH039454B2 (da)	1991-02-08
US4980264A (en)	1990-12-25	Photoresist compositions of controlled dissolution rate in alkaline developers
JPH0138289B2 (da)	1989-08-14
CN1074141C (zh)	2001-10-31	低金属离子含量的对－甲酚低聚物和光敏的组合物
DE1120273B (de)	1961-12-21	Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
US5234791A (en)	1993-08-10	Radiation-curable composition and radiation-sensitive recording material prepared therefrom for use with high-energy radiation
KR19990037508A (ko)	1999-05-25	포토레지스트 조성물 준비방법
JPS5934293B2 (ja)	1984-08-21	感光性組成物
AU610263B2 (en)	1991-05-16	Photostencils for screenprinting
JPS60158440A (ja)	1985-08-19	ポジ型フオトレジスト組成物
JPS62262043A (ja)	1987-11-14	ポジ型感光性樹脂組成物
US3923522A (en)	1975-12-02	Photosensitive composition
US6783913B2 (en)	2004-08-31	Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing
JPS6223788B2 (da)	1987-05-25
JPH04224867A (ja)	1992-08-14	有機溶剤に対する改良された溶解性を有するアゾ染料
JPH0120732B2 (da)	1989-04-18
US5348842A (en)	1994-09-20	Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride
US4722883A (en)	1988-02-02	Process for producing fine patterns
JP2541736B2 (ja)	1996-10-09	オルトナフトキノンジアジドスルフォン酸エステルを含む感光性混合物、およびそれでつくった記録材料
KR20000017053A (ko)	2000-03-25	비누화 폴리(비닐아세테이트)로부터 유도된 감광성수지, 감광성수지를 포함하는 감광성수지조성물 및 그 조성물을 이용한패턴형성방법
JP2001056559A (ja)	2001-02-27	炭酸エステル側鎖を含むポリアミド重合体と耐熱性ホトレジスト組成物
JPH0239048A (ja)	1990-02-08	感光性組成物
US5143815A (en)	1992-09-01	Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture