JPS5612733A - Ion etching method - Google Patents

Ion etching method

Info

Publication number
JPS5612733A
JPS5612733A JP8767179A JP8767179A JPS5612733A JP S5612733 A JPS5612733 A JP S5612733A JP 8767179 A JP8767179 A JP 8767179A JP 8767179 A JP8767179 A JP 8767179A JP S5612733 A JPS5612733 A JP S5612733A
Authority
JP
Japan
Prior art keywords
etching
stepped
photoresist film
sample
conductive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8767179A
Other languages
Japanese (ja)
Inventor
Masanao Itoga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8767179A priority Critical patent/JPS5612733A/en
Publication of JPS5612733A publication Critical patent/JPS5612733A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To form a tapered side end of a sample stepped on the surface by a physical etching of the stepped section in which a protective film is applied over the entire surface of the sample and the etching is given thereto with an ion impact from above. CONSTITUTION:A semiconductor substrate 1 is coated with an aluminum conductive layer 2 on which the photoresist film 3 is entirely formed. The aluminum conductive layer 2 is pointed sharply at the stepped sections as illustrated related to the etching accuracy. Thereafter, the ion beam enters the photoresist film 3 at about 30 deg. to perform etching. At the stepped sections, the etching proceeds faster as the photoresist film 3 is comparably thinner. After the completion of the required etching, with the removal of the photoresist 3, the aluminum is formed in a gentle taper.
JP8767179A 1979-07-11 1979-07-11 Ion etching method Pending JPS5612733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8767179A JPS5612733A (en) 1979-07-11 1979-07-11 Ion etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8767179A JPS5612733A (en) 1979-07-11 1979-07-11 Ion etching method

Publications (1)

Publication Number Publication Date
JPS5612733A true JPS5612733A (en) 1981-02-07

Family

ID=13921401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8767179A Pending JPS5612733A (en) 1979-07-11 1979-07-11 Ion etching method

Country Status (1)

Country Link
JP (1) JPS5612733A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59117725A (en) * 1982-12-24 1984-07-07 Nippon Telegr & Teleph Corp <Ntt> Production of thin film head
JPS62258236A (en) * 1986-05-01 1987-11-10 Nhk Spring Co Ltd Valve spring for engine
JPH01135932A (en) * 1987-11-02 1989-05-29 Altenkirchener Kunststoff Gmbh Tube member composed of return deformable elastic synthetic resin and manufacture thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59117725A (en) * 1982-12-24 1984-07-07 Nippon Telegr & Teleph Corp <Ntt> Production of thin film head
JPS62258236A (en) * 1986-05-01 1987-11-10 Nhk Spring Co Ltd Valve spring for engine
JPH01135932A (en) * 1987-11-02 1989-05-29 Altenkirchener Kunststoff Gmbh Tube member composed of return deformable elastic synthetic resin and manufacture thereof

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