JPS5624979A - Field effect transistor - Google Patents
Field effect transistorInfo
- Publication number
- JPS5624979A JPS5624979A JP10145479A JP10145479A JPS5624979A JP S5624979 A JPS5624979 A JP S5624979A JP 10145479 A JP10145479 A JP 10145479A JP 10145479 A JP10145479 A JP 10145479A JP S5624979 A JPS5624979 A JP S5624979A
- Authority
- JP
- Japan
- Prior art keywords
- density
- gate
- withstand voltage
- contact
- field effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To reduce the source series resistance of a field effect transistor without lowering the gate withstand voltage thereof by lowering the impurity density on the surface relative to the gate withstand voltage, forming the position of impurity high density which lowers the contact resistance at deep position of the GaAs active layer and making it contact with the alloy layer of an ohmic electrode at said position. CONSTITUTION:The density of an active layer 4 on a semi-insulating GaAs substrate 5 is distributed in crest manner of 10<17>cm<-3> on the surface through 2X 10<18>cm<-3> at the maximum, and 10<18>cm<-3> on the substrate surface. The depth of the alloy layer 6 of source and drain electrodes 2 and 3 at both sides of the gate electrode 1 is determined by the thickness of the ohmic metal, the temperature and the time when forming the alloy to each the position 7 of the maximum density. This configuration can sufficiently guarantee the withstand voltage of the gate 1 and realize the low resistance contact so as to perform low noise operation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10145479A JPS5624979A (en) | 1979-08-08 | 1979-08-08 | Field effect transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10145479A JPS5624979A (en) | 1979-08-08 | 1979-08-08 | Field effect transistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5624979A true JPS5624979A (en) | 1981-03-10 |
| JPS6228593B2 JPS6228593B2 (en) | 1987-06-22 |
Family
ID=14301132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10145479A Granted JPS5624979A (en) | 1979-08-08 | 1979-08-08 | Field effect transistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5624979A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5944057U (en) * | 1982-07-26 | 1984-03-23 | スペリ・コ−ポレ−シヨン | GaAs depletion mode device |
| JPS6085567A (en) * | 1983-10-17 | 1985-05-15 | Mitsubishi Electric Corp | Field-effect transistor |
| JPS60247976A (en) * | 1984-05-23 | 1985-12-07 | Nec Corp | Semiconductor device |
| JPS6476774A (en) * | 1987-09-18 | 1989-03-22 | Nec Corp | Semiconductor device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5268379A (en) * | 1975-12-04 | 1977-06-07 | Fujitsu Ltd | Semiconductor device |
| JPS5348488A (en) * | 1976-10-14 | 1978-05-01 | Mitsubishi Electric Corp | Field effect transistor |
-
1979
- 1979-08-08 JP JP10145479A patent/JPS5624979A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5268379A (en) * | 1975-12-04 | 1977-06-07 | Fujitsu Ltd | Semiconductor device |
| JPS5348488A (en) * | 1976-10-14 | 1978-05-01 | Mitsubishi Electric Corp | Field effect transistor |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5944057U (en) * | 1982-07-26 | 1984-03-23 | スペリ・コ−ポレ−シヨン | GaAs depletion mode device |
| JPS6085567A (en) * | 1983-10-17 | 1985-05-15 | Mitsubishi Electric Corp | Field-effect transistor |
| JPS60247976A (en) * | 1984-05-23 | 1985-12-07 | Nec Corp | Semiconductor device |
| JPS6476774A (en) * | 1987-09-18 | 1989-03-22 | Nec Corp | Semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6228593B2 (en) | 1987-06-22 |
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