JPS5664342A - Photomask original plate having protective film on reverse side - Google Patents
Photomask original plate having protective film on reverse sideInfo
- Publication number
- JPS5664342A JPS5664342A JP13868379A JP13868379A JPS5664342A JP S5664342 A JPS5664342 A JP S5664342A JP 13868379 A JP13868379 A JP 13868379A JP 13868379 A JP13868379 A JP 13868379A JP S5664342 A JPS5664342 A JP S5664342A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mold
- protective film
- preventing
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 title abstract 6
- 239000010408 film Substances 0.000 abstract 9
- 239000011521 glass Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 abstract 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000011651 chromium Substances 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 238000007733 ion plating Methods 0.000 abstract 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 230000002265 prevention Effects 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To prevent mold growing during storage in the atmosphere by easy and low cost operation, using a protective film for preventing mold on one face of the glass substrate of a photomask original plate reverse to the light shielding layer of the glass substrate. CONSTITUTION:A protective film for preventing mold is provided on one surface of a glass substrate having a light shielding layer on the other side to form a photomask original plate. As a mold preventing protective film to be applied a film made of silicon dioxide or metallic chromium is recommended. These protective films can be applied by vapor deposition, ion plating, or the like. Before applying the protective film on the reverse face of the glass substrate, preferably a thin film of MgF2, TiO2, CeO2, or the like is attached to it as a reflection preventing film, and on this film the mold preventing film is applied, thus permitting prevention of mold growing, enhancement of optical characteristics of the mask, ad raise of effects of destaticization, etc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13868379A JPS5664342A (en) | 1979-10-29 | 1979-10-29 | Photomask original plate having protective film on reverse side |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13868379A JPS5664342A (en) | 1979-10-29 | 1979-10-29 | Photomask original plate having protective film on reverse side |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61197286A Division JPS6258250A (en) | 1986-08-25 | 1986-08-25 | Photomask negative having protective film on rear face |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5664342A true JPS5664342A (en) | 1981-06-01 |
| JPS622308B2 JPS622308B2 (en) | 1987-01-19 |
Family
ID=15227658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13868379A Granted JPS5664342A (en) | 1979-10-29 | 1979-10-29 | Photomask original plate having protective film on reverse side |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5664342A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4917543A (en) * | 1972-06-12 | 1974-02-16 | ||
| JPS5023595A (en) * | 1973-06-29 | 1975-03-13 | ||
| JPS5193875A (en) * | 1975-02-15 | 1976-08-17 | ||
| JPS51139267A (en) * | 1975-05-28 | 1976-12-01 | Hitachi Ltd | Photo-mask |
-
1979
- 1979-10-29 JP JP13868379A patent/JPS5664342A/en active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4917543A (en) * | 1972-06-12 | 1974-02-16 | ||
| JPS5023595A (en) * | 1973-06-29 | 1975-03-13 | ||
| JPS5193875A (en) * | 1975-02-15 | 1976-08-17 | ||
| JPS51139267A (en) * | 1975-05-28 | 1976-12-01 | Hitachi Ltd | Photo-mask |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS622308B2 (en) | 1987-01-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE169288T1 (en) | TRANSPARENT OBJECT WITH SILICON NITRIDE PROTECTIVE LAYER | |
| JPS57169996A (en) | Magnetooptic storage element | |
| JPS56116003A (en) | Optical part of synthetic resin having reflection preventing film | |
| AU589328B2 (en) | Coating reducing the reflection for an optical element made of organic material | |
| JPS55151601A (en) | Pentagonal prism for camera finder | |
| JPS56150703A (en) | Direction-selective light shielding or reflecting sheet and its production | |
| JPS6488550A (en) | Photomask | |
| JPS5664342A (en) | Photomask original plate having protective film on reverse side | |
| FR1596843A (en) | ||
| JPS57207256A (en) | Photomask | |
| JPS55121441A (en) | Mask for far ultraviolet exposure | |
| JPS5788537A (en) | Optical disc | |
| JPS5587332A (en) | Magnetic light recording medium | |
| JPS56150702A (en) | Direction-selective light shielding or reflecting sheet and its production | |
| JPS544152A (en) | Production of reflection preventive film of transparent optical element | |
| JPS54151457A (en) | Forming method of reflection reducing coating | |
| JPS5453549A (en) | Multilayer thin film optical system | |
| JPS5675601A (en) | Plastic optical parts | |
| JPS52136525A (en) | Stripe filter and its manufacture | |
| JPS51121019A (en) | Process for forming a transparent film of desired refractive index on the surface of substrate | |
| JPS5629238A (en) | Photomask | |
| JPS5689723A (en) | Liquid crystal display device | |
| JPS56110901A (en) | Plastic optical parts | |
| JPS5552001A (en) | Antireflection film of optical parts made of transparent synthetic resin | |
| JPS55122242A (en) | Substrate for optical disc |