JPS5687355A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5687355A JPS5687355A JP16514479A JP16514479A JPS5687355A JP S5687355 A JPS5687355 A JP S5687355A JP 16514479 A JP16514479 A JP 16514479A JP 16514479 A JP16514479 A JP 16514479A JP S5687355 A JPS5687355 A JP S5687355A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type
- layer
- island
- resistance layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/201—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
- H10D84/204—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
- H10D84/209—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only resistors
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To elevate the integration of the semiconductor device without increasing the manufacturing processes by a method wherein an impurity region to be used as a resistance layer or an interconnection layer to be formed in an island region being separated by a P-N junction, is made to be the region provided at the same time with the formation of a isolation region. CONSTITUTION:For example, an N<+> type region 11 and a surrounding P<+> type region 12 are provided selectively on a P type substrate 10, and an N<-> type epitaxial layer 13 is formed on the whole surface of the substrate. The P<+> type isolation region 12a is formed connecting with the previously formed P<+> type region 12 to form the island region 13a. At this time, the P<+> type region 14 is formed simultaneously in the island region. This P<+> type region 14 is used as it is as the low resistance layer or as the crossover interconnection layer. Accordingly the resistance layer or the interconnection layer can be provided without increasing the manufacturing process, and the integration can be elevated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16514479A JPS5687355A (en) | 1979-12-19 | 1979-12-19 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16514479A JPS5687355A (en) | 1979-12-19 | 1979-12-19 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5687355A true JPS5687355A (en) | 1981-07-15 |
Family
ID=15806718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16514479A Pending JPS5687355A (en) | 1979-12-19 | 1979-12-19 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5687355A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01305536A (en) * | 1988-06-03 | 1989-12-08 | Fuji Electric Co Ltd | Semiconductor integrated circuit device |
-
1979
- 1979-12-19 JP JP16514479A patent/JPS5687355A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01305536A (en) * | 1988-06-03 | 1989-12-08 | Fuji Electric Co Ltd | Semiconductor integrated circuit device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5687355A (en) | Semiconductor device | |
| JPS5660054A (en) | Semiconductor integrated circuit | |
| JPS5619653A (en) | Bipolar cmos semiconductor device and manufacture thereof | |
| JPS5420678A (en) | Production of silicon monocrystaline island regions | |
| JPS57164560A (en) | Manufacture of semiconductor integrated circuit device | |
| JPS5586182A (en) | Manufacture of semiconductor device | |
| JPS55102263A (en) | Semiconductor integrated circuit | |
| JPS54127689A (en) | Semiconductor integrated circuit | |
| JPS5443683A (en) | Production of transistor | |
| JPS6445159A (en) | Semiconductor device | |
| JPS5655060A (en) | Semiconductor integrated circuit device | |
| JPS5310286A (en) | Production of semiconductor device | |
| JPS6425566A (en) | Manufacture of semiconductor integrated circuit | |
| JPS5244163A (en) | Process for productin of semiconductor element | |
| JPS6467936A (en) | Manufacture of semiconductor device | |
| JPS5666067A (en) | Semiconductor device and its manufacture | |
| JPS5610925A (en) | Preparation of semiconductor device | |
| JPS5568650A (en) | Manufacturing method of semiconductor device | |
| JPS55146964A (en) | Manufacture of semiconductor device | |
| JPS5637622A (en) | Manufacture of semiconductor device | |
| JPS5491079A (en) | Manufacture of semiconductor device | |
| JPS57188860A (en) | Semiconductor device | |
| JPS54158876A (en) | Manufacture of semiconductor device | |
| JPS55105343A (en) | Manufacturing method of semiconductor device | |
| JPS51117882A (en) | Semiconductor device manufacturing method |