JPS57182152A - Diffraction device - Google Patents

Diffraction device

Info

Publication number
JPS57182152A
JPS57182152A JP57065246A JP6524682A JPS57182152A JP S57182152 A JPS57182152 A JP S57182152A JP 57065246 A JP57065246 A JP 57065246A JP 6524682 A JP6524682 A JP 6524682A JP S57182152 A JPS57182152 A JP S57182152A
Authority
JP
Japan
Prior art keywords
diffraction device
diffraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57065246A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0421840B2 (fr
Inventor
Kei Sumisaa Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Government of the United States of America
Original Assignee
Government of the United States of America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Government of the United States of America filed Critical Government of the United States of America
Publication of JPS57182152A publication Critical patent/JPS57182152A/ja
Publication of JPH0421840B2 publication Critical patent/JPH0421840B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP57065246A 1981-04-20 1982-04-19 Diffraction device Granted JPS57182152A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25597481A 1981-04-20 1981-04-20

Publications (2)

Publication Number Publication Date
JPS57182152A true JPS57182152A (en) 1982-11-09
JPH0421840B2 JPH0421840B2 (fr) 1992-04-14

Family

ID=22970630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57065246A Granted JPS57182152A (en) 1981-04-20 1982-04-19 Diffraction device

Country Status (6)

Country Link
JP (1) JPS57182152A (fr)
CA (1) CA1183285A (fr)
DE (1) DE3214611A1 (fr)
FR (1) FR2504308B1 (fr)
IT (1) IT1150848B (fr)
NL (1) NL8201621A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60111125A (ja) * 1983-11-21 1985-06-17 Hitachi Ltd モノクロメ−タ
JPS61197547U (fr) * 1985-05-29 1986-12-10
US4699509A (en) * 1984-04-21 1987-10-13 Nippon Soken, Inc. Device for measuring contamination of lubricant
JPH02179500A (ja) * 1988-12-29 1990-07-12 Shimadzu Corp 軟ｘ線用フレネルゾーンプレート
JPH0692946B2 (ja) * 1988-06-16 1994-11-16 フラウンホッファー―ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー．ファオ． 隔膜表面の構造を検査する方法及び装置
JP2008170236A (ja) * 2007-01-10 2008-07-24 High Energy Accelerator Research Organization Ｘ線及び中性子線の反射率曲線測定方法及び測定装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
JPH0782117B2 (ja) * 1989-02-23 1995-09-06 オリンパス光学工業株式会社 反射型結像光学系
WO1995005725A1 (fr) * 1993-08-16 1995-02-23 Commonwealth Scientific And Industrial Research Organisation Optique amelioree pour rayons x destinee notamment a l'imagerie a contraste de phase

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50144678U (fr) * 1974-05-15 1975-11-29

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3777156A (en) * 1972-02-14 1973-12-04 Hewlett Packard Co Bent diffraction crystal with geometrical aberration compensation
US4012843A (en) * 1973-04-25 1977-03-22 Hitachi, Ltd. Concave diffraction grating and a manufacturing method thereof
US3980883A (en) * 1973-05-15 1976-09-14 National Research Development Corporation X-ray diffraction gratings
US3991309A (en) * 1975-07-09 1976-11-09 University Of Rochester Methods and apparatus for the control and analysis of X-rays
US4132654A (en) * 1976-07-02 1979-01-02 The Machlett Laboratories, Inc. X-ray focal spot test system
US4192994A (en) * 1978-09-18 1980-03-11 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Diffractoid grating configuration for X-ray and ultraviolet focusing

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50144678U (fr) * 1974-05-15 1975-11-29

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60111125A (ja) * 1983-11-21 1985-06-17 Hitachi Ltd モノクロメ−タ
US4699509A (en) * 1984-04-21 1987-10-13 Nippon Soken, Inc. Device for measuring contamination of lubricant
JPS61197547U (fr) * 1985-05-29 1986-12-10
JPH0692946B2 (ja) * 1988-06-16 1994-11-16 フラウンホッファー―ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー．ファオ． 隔膜表面の構造を検査する方法及び装置
JPH02179500A (ja) * 1988-12-29 1990-07-12 Shimadzu Corp 軟ｘ線用フレネルゾーンプレート
JP2008170236A (ja) * 2007-01-10 2008-07-24 High Energy Accelerator Research Organization Ｘ線及び中性子線の反射率曲線測定方法及び測定装置

Also Published As

Publication number Publication date
FR2504308B1 (fr) 1988-09-02
IT8220815A0 (it) 1982-04-19
IT1150848B (it) 1986-12-17
CA1183285A (fr) 1985-02-26
JPH0421840B2 (fr) 1992-04-14
DE3214611A1 (de) 1982-11-04
FR2504308A1 (fr) 1982-10-22
NL8201621A (nl) 1982-11-16

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