JPH0421840B2 - - Google Patents

Info

Publication number
JPH0421840B2
JPH0421840B2 JP57065246A JP6524682A JPH0421840B2 JP H0421840 B2 JPH0421840 B2 JP H0421840B2 JP 57065246 A JP57065246 A JP 57065246A JP 6524682 A JP6524682 A JP 6524682A JP H0421840 B2 JPH0421840 B2 JP H0421840B2
Authority
JP
Japan
Prior art keywords
diffraction
crystal
receiving surface
spacing
interplanar spacing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57065246A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57182152A (en
Inventor
Kei Sumisaa Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Department of Energy
Original Assignee
US Department of Energy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by US Department of Energy filed Critical US Department of Energy
Publication of JPS57182152A publication Critical patent/JPS57182152A/ja
Publication of JPH0421840B2 publication Critical patent/JPH0421840B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP57065246A 1981-04-20 1982-04-19 Diffraction device Granted JPS57182152A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25597481A 1981-04-20 1981-04-20

Publications (2)

Publication Number Publication Date
JPS57182152A JPS57182152A (en) 1982-11-09
JPH0421840B2 true JPH0421840B2 (fr) 1992-04-14

Family

ID=22970630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57065246A Granted JPS57182152A (en) 1981-04-20 1982-04-19 Diffraction device

Country Status (6)

Country Link
JP (1) JPS57182152A (fr)
CA (1) CA1183285A (fr)
DE (1) DE3214611A1 (fr)
FR (1) FR2504308B1 (fr)
IT (1) IT1150848B (fr)
NL (1) NL8201621A (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
JPS60111125A (ja) * 1983-11-21 1985-06-17 Hitachi Ltd モノクロメ−タ
US4699509A (en) * 1984-04-21 1987-10-13 Nippon Soken, Inc. Device for measuring contamination of lubricant
JPH0515120Y2 (fr) * 1985-05-29 1993-04-21
DE3820549A1 (de) * 1988-06-16 1989-12-21 Fraunhofer Ges Forschung Verfahren und vorrichtung zur untersuchung von membranoberflaechen
JPH02179500A (ja) * 1988-12-29 1990-07-12 Shimadzu Corp 軟ｘ線用フレネルゾーンプレート
JPH0782117B2 (ja) * 1989-02-23 1995-09-06 オリンパス光学工業株式会社 反射型結像光学系
WO1995005725A1 (fr) * 1993-08-16 1995-02-23 Commonwealth Scientific And Industrial Research Organisation Optique amelioree pour rayons x destinee notamment a l'imagerie a contraste de phase
JP4521573B2 (ja) * 2007-01-10 2010-08-11 大学共同利用機関法人 高エネルギー加速器研究機構 中性子線の反射率曲線測定方法及び測定装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3777156A (en) * 1972-02-14 1973-12-04 Hewlett Packard Co Bent diffraction crystal with geometrical aberration compensation
US4012843A (en) * 1973-04-25 1977-03-22 Hitachi, Ltd. Concave diffraction grating and a manufacturing method thereof
US3980883A (en) * 1973-05-15 1976-09-14 National Research Development Corporation X-ray diffraction gratings
JPS5256856Y2 (fr) * 1974-05-15 1977-12-22
US3991309A (en) * 1975-07-09 1976-11-09 University Of Rochester Methods and apparatus for the control and analysis of X-rays
US4132654A (en) * 1976-07-02 1979-01-02 The Machlett Laboratories, Inc. X-ray focal spot test system
US4192994A (en) * 1978-09-18 1980-03-11 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Diffractoid grating configuration for X-ray and ultraviolet focusing

Also Published As

Publication number Publication date
FR2504308B1 (fr) 1988-09-02
IT8220815A0 (it) 1982-04-19
IT1150848B (it) 1986-12-17
CA1183285A (fr) 1985-02-26
DE3214611A1 (de) 1982-11-04
FR2504308A1 (fr) 1982-10-22
NL8201621A (nl) 1982-11-16
JPS57182152A (en) 1982-11-09

Similar Documents

Publication Publication Date Title
US4429411A (en) Instrument and method for focusing X-rays, gamma rays and neutrons
EP0322408B1 (fr) Instruments de conditionnement de faisceaux a rayons x ou a neutrons
US6226349B1 (en) X-ray analysis apparatus with a graded multilayer mirror
Batterman et al. X-ray Pendellösung fringes in Darwin reflection
US12209977B2 (en) X-ray detector system with at least two stacked flat Bragg diffractors
JPS6098399A (ja) ポイントソースｘ線集束装置
EP0635716B1 (fr) Monochromateur asymétrique à 4 cristaux
US3772522A (en) Crystal monochromator and method of fabricating a diffraction crystal employed therein
WO2009083605A1 (fr) Dispositif à faisceau de rayons x
US3777156A (en) Bent diffraction crystal with geometrical aberration compensation
Zhong et al. Sagittal focusing of high-energy synchrotron X-rays with asymmetric Laue crystals. II. Experimental studies
US5164975A (en) Multiple wavelength X-ray monochromators
JPH0421840B2 (fr)
Wagner et al. A doubly bent silicon monochromator
Ohtsubo et al. Design of nano-spintronics beamline at 3-GeV next-generation synchrotron radiation facility, NanoTerasu
Berthold et al. Performance of a versatile instrumentation for inelastic X-ray scattering spectroscopy (IXSS) with synchrotron radiation
Suortti et al. Focusing monochromators for high energy synchrotron radiation
JP2940757B2 (ja) Ｘ線回折分析装置
Freund On the use of focusing for small-angle scattering experiments
Smither Instrument and method for focusing x-rays, gamma rays, and neutrons
US5287395A (en) Inclined monochromator for high heat-load synchrotron x-ray radiation
Tarazona et al. 2D imaging of an undulator source by phase circular Bragg–Fresnel lens
Smither A new method for focusing and imaging X-rays and gamma-rays with diffraction crystals
Kashiwase et al. A diffraction pattern caused by thermal diffuse scattering of X-rays in a pyrolytic graphite crystal
Smither Focussing X-rays, gamma rays and neutrons