JPS57200042A - Exposure method for chemically machinable photosensitive glass - Google Patents

Exposure method for chemically machinable photosensitive glass

Info

Publication number
JPS57200042A
JPS57200042A JP56083843A JP8384381A JPS57200042A JP S57200042 A JPS57200042 A JP S57200042A JP 56083843 A JP56083843 A JP 56083843A JP 8384381 A JP8384381 A JP 8384381A JP S57200042 A JPS57200042 A JP S57200042A
Authority
JP
Japan
Prior art keywords
plate
photosensitive glass
light source
angle
taper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56083843A
Other languages
English (en)
Other versions
JPH0136095B2 (ja
Inventor
Yoshimi Fujita
Toshiharu Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP56083843A priority Critical patent/JPS57200042A/ja
Priority to US06/384,111 priority patent/US4444616A/en
Publication of JPS57200042A publication Critical patent/JPS57200042A/ja
Publication of JPH0136095B2 publication Critical patent/JPH0136095B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • H01J17/38—Cold-cathode tubes
    • H01J17/48—Cold-cathode tubes with more than one cathode or anode, e.g. sequence-discharge tube, counting tube, dekatron
    • H01J17/49—Display panels, e.g. with crossed electrodes, e.g. making use of direct current
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
JP56083843A 1981-06-02 1981-06-02 Exposure method for chemically machinable photosensitive glass Granted JPS57200042A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56083843A JPS57200042A (en) 1981-06-02 1981-06-02 Exposure method for chemically machinable photosensitive glass
US06/384,111 US4444616A (en) 1981-06-02 1982-06-01 Method for exposure of chemically machinable light-sensitive glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56083843A JPS57200042A (en) 1981-06-02 1981-06-02 Exposure method for chemically machinable photosensitive glass

Publications (2)

Publication Number Publication Date
JPS57200042A true JPS57200042A (en) 1982-12-08
JPH0136095B2 JPH0136095B2 (ja) 1989-07-28

Family

ID=13813983

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56083843A Granted JPS57200042A (en) 1981-06-02 1981-06-02 Exposure method for chemically machinable photosensitive glass

Country Status (2)

Country Link
US (1) US4444616A (ja)
JP (1) JPS57200042A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0459628A (ja) * 1990-06-29 1992-02-26 Seikosha Co Ltd ガラス板の加工方法
JP2007123614A (ja) * 2005-10-28 2007-05-17 Kyocera Kinseki Corp 露光装置、ウェハ及び露光方法
JP2008026554A (ja) * 2006-07-20 2008-02-07 Fujifilm Corp 露光装置
WO2008020631A1 (en) * 2006-08-18 2008-02-21 Toppan Printing Co., Ltd. Method for producing original plate, method for producing microneedle patch, microneedle patch, and exposure apparatus
JP2008046508A (ja) * 2006-08-18 2008-02-28 Toppan Printing Co Ltd 露光装置及び方法
JP2008046507A (ja) * 2006-08-18 2008-02-28 Toppan Printing Co Ltd 原版及びマイクロニードルのパッチの製造方法、並びにマイクロニードルのパッチ

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60230601A (ja) * 1984-05-01 1985-11-16 Masayasu Negishi 膜処理方法
JPS61202426A (ja) * 1985-03-05 1986-09-08 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
US4662985A (en) * 1985-03-27 1987-05-05 Fuji Photo Film Co., Ltd. Method of smoothing out an irregular surface of an electronic device
US4771012A (en) * 1986-06-13 1988-09-13 Matsushita Electric Industrial Co., Ltd. Method of making symmetrically controlled implanted regions using rotational angle of the substrate
USRE35036E (en) * 1986-06-13 1995-09-12 Matsushita Electric Industrial Co., Ltd. Method of making symmetrically controlled implanted regions using rotational angle of the substrate
US4906594A (en) * 1987-06-12 1990-03-06 Agency Of Industrial Science And Technology Surface smoothing method and method of forming SOI substrate using the surface smoothing method
US5086297A (en) * 1988-06-14 1992-02-04 Dai Nippon Insatsu Kabushiki Kaisha Plasma display panel and method of forming fluorescent screen thereof
DE3842354A1 (de) * 1988-12-16 1990-06-21 Kernforschungsz Karlsruhe Verfahren zur lithographischen herstellung von galvanisch abformbaren mikrostrukturen mit dreieckigem oder trapezfoermigem querschnitt
US6127279A (en) * 1994-09-26 2000-10-03 Semiconductor Energy Laboratory Co., Ltd. Solution applying method
EP1416325A1 (en) * 2002-10-29 2004-05-06 Corning Incorporated A master and method of manufacturing a master for molds used to produce microstructured devices
FR2858694B1 (fr) * 2003-08-07 2006-08-18 Commissariat Energie Atomique Procede de realisation de motifs a flancs inclines par photolithographie
JP4802093B2 (ja) * 2004-04-09 2011-10-26 株式会社クラレ 微細構造体の製造方法、該微細構造体を用いたスタンパの製造方法、及び該スタンパを用いた樹脂製の微細構造体の製造方法
US7132054B1 (en) * 2004-09-08 2006-11-07 Sandia Corporation Method to fabricate hollow microneedle arrays
CN100483161C (zh) * 2007-04-13 2009-04-29 中国科学院上海微系统与信息技术研究所 一种狭缝装置制作方法
WO2010080115A2 (en) 2008-12-18 2010-07-15 Claros Diagnostics, Inc. Improved reagent storage in microfluidic systems and related articles and methods
ES2812260T3 (es) 2009-02-02 2021-03-16 Opko Diagnostics Llc Estructuras para controlar la interacción de luz con dispositivos microfluídicos
WO2015171597A1 (en) 2014-05-05 2015-11-12 3D Glass Solutions, Inc. 2d and 3d inductors antenna and transformers fabricating photoactive substrates
KR20180134868A (ko) 2016-02-25 2018-12-19 3디 글래스 솔루션즈 인코포레이티드 3d 커패시터 및 커패시터 어레이 제작용 광활성 기재
US12165809B2 (en) 2016-02-25 2024-12-10 3D Glass Solutions, Inc. 3D capacitor and capacitor array fabricating photoactive substrates
WO2017177171A1 (en) * 2016-04-08 2017-10-12 3D Glass Solutions, Inc. Methods of fabricating photosensitive substrates suitable for optical coupler
EP3616254B1 (en) 2017-04-28 2023-06-14 3D Glass Solutions, Inc. Rf circulator
CA3067812C (en) 2017-07-07 2023-03-14 3D Glass Solutions, Inc. 2d and 3d rf lumped element devices for rf system in a package photoactive glass substrates
KR102614826B1 (ko) 2017-12-15 2023-12-19 3디 글래스 솔루션즈 인코포레이티드 결합 전송 라인 공진 rf 필터
JP7226832B2 (ja) 2018-01-04 2023-02-21 スリーディー グラス ソリューションズ，インク 高効率ｒｆ回路のためのインピーダンス整合伝導構造
JP7053084B2 (ja) 2018-09-17 2022-04-12 スリーディー グラス ソリューションズ，インク グランドプレーンを備えた高効率のコンパクトなスロット付きアンテナ
CA3107812C (en) 2018-12-28 2023-06-27 3D Glass Solutions, Inc. Annular capacitor rf, microwave and mm wave systems
EP3903347A4 (en) 2018-12-28 2022-03-09 3D Glass Solutions, Inc. HETEROGENE INTEGRATION FOR HF, MICROWAVE AND MM WAVE SYSTEMS ON PHOTOACTIVE GLASS SUBSTRATES
CA3135975C (en) 2019-04-05 2022-11-22 3D Glass Solutions, Inc. Glass based empty substrate integrated waveguide devices
JP7188825B2 (ja) 2019-04-18 2022-12-13 スリーディー グラス ソリューションズ，インク 高効率ダイダイシング及びリリース
JP2023516817A (ja) 2020-04-17 2023-04-20 スリーディー グラス ソリューションズ，インク 広帯域誘導

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49133782A (ja) * 1973-04-28 1974-12-23

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2628160A (en) * 1951-08-30 1953-02-10 Corning Glass Works Sculpturing glass
US4276335A (en) * 1978-03-13 1981-06-30 General Electric Company Electron beam matrix deflector and method of fabrication

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49133782A (ja) * 1973-04-28 1974-12-23

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0459628A (ja) * 1990-06-29 1992-02-26 Seikosha Co Ltd ガラス板の加工方法
JP2007123614A (ja) * 2005-10-28 2007-05-17 Kyocera Kinseki Corp 露光装置、ウェハ及び露光方法
JP2008026554A (ja) * 2006-07-20 2008-02-07 Fujifilm Corp 露光装置
WO2008020631A1 (en) * 2006-08-18 2008-02-21 Toppan Printing Co., Ltd. Method for producing original plate, method for producing microneedle patch, microneedle patch, and exposure apparatus
JP2008046508A (ja) * 2006-08-18 2008-02-28 Toppan Printing Co Ltd 露光装置及び方法
JP2008046507A (ja) * 2006-08-18 2008-02-28 Toppan Printing Co Ltd 原版及びマイクロニードルのパッチの製造方法、並びにマイクロニードルのパッチ
US8062835B2 (en) 2006-08-18 2011-11-22 Toppan Printing Co., Ltd. Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus

Also Published As

Publication number Publication date
US4444616A (en) 1984-04-24
JPH0136095B2 (ja) 1989-07-28

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