JPS572034A - Mask image forming material and formation of mask image - Google Patents
Mask image forming material and formation of mask imageInfo
- Publication number
- JPS572034A JPS572034A JP7580180A JP7580180A JPS572034A JP S572034 A JPS572034 A JP S572034A JP 7580180 A JP7580180 A JP 7580180A JP 7580180 A JP7580180 A JP 7580180A JP S572034 A JPS572034 A JP S572034A
- Authority
- JP
- Japan
- Prior art keywords
- mask image
- irradiated
- active component
- imagewise
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title abstract 6
- 230000015572 biosynthetic process Effects 0.000 title 1
- 238000004040 coloring Methods 0.000 abstract 5
- 238000010521 absorption reaction Methods 0.000 abstract 3
- 239000011347 resin Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- JQXYBDVZAUEPDL-UHFFFAOYSA-N 2-methylidene-5-phenylpent-4-enoic acid Chemical compound OC(=O)C(=C)CC=CC1=CC=CC=C1 JQXYBDVZAUEPDL-UHFFFAOYSA-N 0.000 abstract 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 abstract 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- DWWMSEANWMWMCB-UHFFFAOYSA-N tribromomethylsulfonylbenzene Chemical compound BrC(Br)(Br)S(=O)(=O)C1=CC=CC=C1 DWWMSEANWMWMCB-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
PURPOSE:To form an image with a clear image profile and an accurate image width by using a mask image forming material having a photosensitive layer contg. an active component, a color developing component, a photosensitive resin and a coloring material showing absorption in a specified wavelength region on a transparent support. CONSTITUTION:This mask image forming material has a photosensitive layer contg. an active component such as tribromomethylphenylsulfone, a color developing component such as leucoxanthene, a photosensitive resin such as a styrene-methacrylic acid copolymer and a coloring material showing absorption in the 340-450nm wavelength region on a transparent support such as a PE film. The coloring material is added in an amount enough to provide >=1.0 optical density. The photosensitive layer is irradiated (A) with active rays of radiant light, whereby the active component is reacted with the color developing component to form a coloring compound in the irradiated part. The layer is then irradiated (B) with light not changing the active component and the resin by itself and having a wavelength region where the coloring compound shows absorption. One of the irradiations A, B is conducted imagewise, the other is carried out uniformly all over the surface to harden the imagewise irradiated part, and the imagewise unirradiated part is removed to form a mask image.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7580180A JPS572034A (en) | 1980-06-05 | 1980-06-05 | Mask image forming material and formation of mask image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7580180A JPS572034A (en) | 1980-06-05 | 1980-06-05 | Mask image forming material and formation of mask image |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS572034A true JPS572034A (en) | 1982-01-07 |
Family
ID=13586658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7580180A Pending JPS572034A (en) | 1980-06-05 | 1980-06-05 | Mask image forming material and formation of mask image |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS572034A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59166945A (en) * | 1982-10-25 | 1984-09-20 | Nippon Kankoushi Kogyo Kk | Water-developable photosensitive sheet having high light shielding property |
| JPS59166946A (en) * | 1982-10-25 | 1984-09-20 | Nippon Kankoushi Kogyo Kk | Water-developable copying material |
| JPS59218441A (en) * | 1983-04-25 | 1984-12-08 | Nippon Soda Co Ltd | Color developing photosensitive resin composition |
| JPS62112574U (en) * | 1986-01-09 | 1987-07-17 | ||
| JPS6355539A (en) * | 1986-05-30 | 1988-03-10 | Toyobo Co Ltd | Image forming material and image forming method |
| US5262247A (en) * | 1989-05-17 | 1993-11-16 | Fukuda Kinzoku Hakufun Kogyo Kabushiki Kaisha | Thin copper foil for printed wiring board |
| WO2010109859A1 (en) * | 2009-03-24 | 2010-09-30 | 太陽インキ製造株式会社 | Image forming method and photocurable composition |
| JP2010225909A (en) * | 2009-03-24 | 2010-10-07 | Taiyo Ink Mfg Ltd | Image forming method, photocured image, and photocurable composition used in the method |
| JP2011068755A (en) * | 2009-09-25 | 2011-04-07 | Taiyo Holdings Co Ltd | Photocurable composition |
| WO2011105011A1 (en) * | 2010-02-26 | 2011-09-01 | 太陽ホールディングス株式会社 | Image formation method and photosensitive composition used in said method |
-
1980
- 1980-06-05 JP JP7580180A patent/JPS572034A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59166945A (en) * | 1982-10-25 | 1984-09-20 | Nippon Kankoushi Kogyo Kk | Water-developable photosensitive sheet having high light shielding property |
| JPS59166946A (en) * | 1982-10-25 | 1984-09-20 | Nippon Kankoushi Kogyo Kk | Water-developable copying material |
| JPS59218441A (en) * | 1983-04-25 | 1984-12-08 | Nippon Soda Co Ltd | Color developing photosensitive resin composition |
| JPS62112574U (en) * | 1986-01-09 | 1987-07-17 | ||
| JPS6355539A (en) * | 1986-05-30 | 1988-03-10 | Toyobo Co Ltd | Image forming material and image forming method |
| US5262247A (en) * | 1989-05-17 | 1993-11-16 | Fukuda Kinzoku Hakufun Kogyo Kabushiki Kaisha | Thin copper foil for printed wiring board |
| WO2010109859A1 (en) * | 2009-03-24 | 2010-09-30 | 太陽インキ製造株式会社 | Image forming method and photocurable composition |
| JP2010225909A (en) * | 2009-03-24 | 2010-10-07 | Taiyo Ink Mfg Ltd | Image forming method, photocured image, and photocurable composition used in the method |
| JP2011068755A (en) * | 2009-09-25 | 2011-04-07 | Taiyo Holdings Co Ltd | Photocurable composition |
| WO2011105011A1 (en) * | 2010-02-26 | 2011-09-01 | 太陽ホールディングス株式会社 | Image formation method and photosensitive composition used in said method |
| CN102770805A (en) * | 2010-02-26 | 2012-11-07 | 太阳控股株式会社 | Image formation method and photosensitive composition used in said method |
| JPWO2011105011A1 (en) * | 2010-02-26 | 2013-06-17 | 太陽ホールディングス株式会社 | Image forming method and photosensitive composition used in the method |
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