JPS5725654A - Method of forming ions - Google Patents
Method of forming ionsInfo
- Publication number
- JPS5725654A JPS5725654A JP9865980A JP9865980A JPS5725654A JP S5725654 A JPS5725654 A JP S5725654A JP 9865980 A JP9865980 A JP 9865980A JP 9865980 A JP9865980 A JP 9865980A JP S5725654 A JPS5725654 A JP S5725654A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- source
- atomic number
- chemically stable
- supplied amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9865980A JPS5725654A (en) | 1980-07-21 | 1980-07-21 | Method of forming ions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9865980A JPS5725654A (en) | 1980-07-21 | 1980-07-21 | Method of forming ions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5725654A true JPS5725654A (en) | 1982-02-10 |
| JPS638577B2 JPS638577B2 (fr) | 1988-02-23 |
Family
ID=14225636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9865980A Granted JPS5725654A (en) | 1980-07-21 | 1980-07-21 | Method of forming ions |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5725654A (fr) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6273543A (ja) * | 1985-09-27 | 1987-04-04 | Hitachi Ltd | 水素イオン源 |
| JPS63124355A (ja) * | 1985-10-31 | 1988-05-27 | ゼネラル・エレクトリック・カンパニイ | イオン注入装置及び方法 |
| JP2010517304A (ja) * | 2007-01-25 | 2010-05-20 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | ガス希釈によるイオン源の性能向上及び寿命延長方法及び装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4847890A (fr) * | 1971-10-18 | 1973-07-06 | ||
| JPS534780A (en) * | 1976-07-02 | 1978-01-17 | Tsuneo Nishida | Reactionary ionic plating process |
-
1980
- 1980-07-21 JP JP9865980A patent/JPS5725654A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4847890A (fr) * | 1971-10-18 | 1973-07-06 | ||
| JPS534780A (en) * | 1976-07-02 | 1978-01-17 | Tsuneo Nishida | Reactionary ionic plating process |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6273543A (ja) * | 1985-09-27 | 1987-04-04 | Hitachi Ltd | 水素イオン源 |
| JPS63124355A (ja) * | 1985-10-31 | 1988-05-27 | ゼネラル・エレクトリック・カンパニイ | イオン注入装置及び方法 |
| JP2010517304A (ja) * | 2007-01-25 | 2010-05-20 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | ガス希釈によるイオン源の性能向上及び寿命延長方法及び装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS638577B2 (fr) | 1988-02-23 |
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