JPS638577B2 - - Google Patents

Info

Publication number
JPS638577B2
JPS638577B2 JP55098659A JP9865980A JPS638577B2 JP S638577 B2 JPS638577 B2 JP S638577B2 JP 55098659 A JP55098659 A JP 55098659A JP 9865980 A JP9865980 A JP 9865980A JP S638577 B2 JPS638577 B2 JP S638577B2
Authority
JP
Japan
Prior art keywords
gas
ion
raw material
mixed
ion current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55098659A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5725654A (en
Inventor
Yukio Irita
Kenji Kajama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9865980A priority Critical patent/JPS5725654A/ja
Publication of JPS5725654A publication Critical patent/JPS5725654A/ja
Publication of JPS638577B2 publication Critical patent/JPS638577B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
JP9865980A 1980-07-21 1980-07-21 Method of forming ions Granted JPS5725654A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9865980A JPS5725654A (en) 1980-07-21 1980-07-21 Method of forming ions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9865980A JPS5725654A (en) 1980-07-21 1980-07-21 Method of forming ions

Publications (2)

Publication Number Publication Date
JPS5725654A JPS5725654A (en) 1982-02-10
JPS638577B2 true JPS638577B2 (fr) 1988-02-23

Family

ID=14225636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9865980A Granted JPS5725654A (en) 1980-07-21 1980-07-21 Method of forming ions

Country Status (1)

Country Link
JP (1) JPS5725654A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766759B2 (ja) * 1985-09-27 1995-07-19 株式会社日立製作所 水素イオン源
JP2654004B2 (ja) * 1985-10-31 1997-09-17 ゼネラル・エレクトリック・カンパニイ イオン注入装置及び方法
US7586109B2 (en) * 2007-01-25 2009-09-08 Varian Semiconductor Equipment Associates, Inc. Technique for improving the performance and extending the lifetime of an ion source with gas dilution

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4847890A (fr) * 1971-10-18 1973-07-06
JPS534780A (en) * 1976-07-02 1978-01-17 Tsuneo Nishida Reactionary ionic plating process

Also Published As

Publication number Publication date
JPS5725654A (en) 1982-02-10

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