JPS5743418A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5743418A
JPS5743418A JP55119332A JP11933280A JPS5743418A JP S5743418 A JPS5743418 A JP S5743418A JP 55119332 A JP55119332 A JP 55119332A JP 11933280 A JP11933280 A JP 11933280A JP S5743418 A JPS5743418 A JP S5743418A
Authority
JP
Japan
Prior art keywords
layer
electrode material
insulating layer
electrode
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55119332A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6328335B2 (2
Inventor
Ichiro Fujita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55119332A priority Critical patent/JPS5743418A/ja
Publication of JPS5743418A publication Critical patent/JPS5743418A/ja
Publication of JPS6328335B2 publication Critical patent/JPS6328335B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/069—Manufacture or treatment of conductive parts of the interconnections by forming self-aligned vias or self-aligned contact plugs

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP55119332A 1980-08-29 1980-08-29 Manufacture of semiconductor device Granted JPS5743418A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55119332A JPS5743418A (en) 1980-08-29 1980-08-29 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55119332A JPS5743418A (en) 1980-08-29 1980-08-29 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5743418A true JPS5743418A (en) 1982-03-11
JPS6328335B2 JPS6328335B2 (2) 1988-06-08

Family

ID=14758851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55119332A Granted JPS5743418A (en) 1980-08-29 1980-08-29 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5743418A (2)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051257A (2) * 1973-09-05 1975-05-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051257A (2) * 1973-09-05 1975-05-08

Also Published As

Publication number Publication date
JPS6328335B2 (2) 1988-06-08

Similar Documents

Publication Publication Date Title
JPS5249772A (en) Process for production of semiconductor device
JPS55154743A (en) Semiconductor device and method of fabricating the same
JPS5743418A (en) Manufacture of semiconductor device
JPS6472567A (en) Manufacture of semiconductor device
JPS57167659A (en) Manufacture of semiconductor device
JPS57211734A (en) Manufacture of semiconductor device
JPS52124860A (en) Electrode formation method for semiconductor devices
JPS5791537A (en) Manufacture of semiconductor device
JPS5637674A (en) Manufacture of semiconductor device
JPS57193062A (en) Manufacture of semiconductor device
JPS5732653A (en) Manufacture of semiconductor device
JPS5735340A (en) Manufacture of semiconductor device
JPS53147482A (en) Production of semiconductor device
JPS5227362A (en) Formation method of passivation film
JPS5380167A (en) Manufacture of semiconductor device
JPS5286079A (en) Production of semiconductive device
JPS5272186A (en) Production of mis type semiconductor device
JPS6461927A (en) Manufacture of semiconductor device
JPS5662370A (en) Manufacturing of semiconductor device
JPS5251872A (en) Production of semiconductor device
JPS546775A (en) Semiconductor device featuring stepped electrode structure
JPS5754346A (ja) Taketsushoshirikonhaisensonokeiseihoho
JPS5587488A (en) Production of semiconductor device
JPS5636164A (en) Manufacture of semiconductor device
JPS5690539A (en) Production of semiconductor device