JPS574501A - Monitoring device - Google Patents
Monitoring deviceInfo
- Publication number
- JPS574501A JPS574501A JP7926280A JP7926280A JPS574501A JP S574501 A JPS574501 A JP S574501A JP 7926280 A JP7926280 A JP 7926280A JP 7926280 A JP7926280 A JP 7926280A JP S574501 A JPS574501 A JP S574501A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- temperature
- evaporated
- sensitive element
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012806 monitoring device Methods 0.000 title 1
- 238000001704 evaporation Methods 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 3
- 238000005259 measurement Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000007738 vacuum evaporation Methods 0.000 abstract 2
- 239000000919 ceramic Substances 0.000 abstract 1
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000012544 monitoring process Methods 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Abstract
PURPOSE:To enable the correct measurement of a film thickness through the elimination of the influence exercised by a change in temperature, by a method wherein a temperature-sensitive element is placed on a monitoring substrate with a temperature being approximately equal to that of a film, and the temperature of the film is measured directly. CONSTITUTION:A temperature-sensitive element 3, such as thermocouples, thermisters, etc., is previously adhered to an insulating substrate 1, such as ceramic, glass, etc., between electrode films 2a and 2b by vacuum-evaporation, sintering and other means, and an evaporating material 4 is vacuum-evaporated between electrodes 2a and 2b. In case the temperature-sensitive element is vacuum-evaporated to between the electrodes 2a and 2b, and the evaporating material 4 is vacuum-evaporated to between the electrodes 2c and 2d, the vacuum-evaporation takes place by using a mask 6 having a slot 5, which has the same shape and size as those of the vacuum- evaporated part, so that the temperature-sensitive element or the vacuum-evaporating material is prevented from being vacuum-evaporated at a part except their respective vacuum-evaporated part. This permits the measurement of a film thickness with almost no error.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7926280A JPS574501A (en) | 1980-06-12 | 1980-06-12 | Monitoring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7926280A JPS574501A (en) | 1980-06-12 | 1980-06-12 | Monitoring device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS574501A true JPS574501A (en) | 1982-01-11 |
Family
ID=13684935
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7926280A Pending JPS574501A (en) | 1980-06-12 | 1980-06-12 | Monitoring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS574501A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS604805A (en) * | 1983-06-23 | 1985-01-11 | Sunstar Giken Kk | Thickness measuring device |
-
1980
- 1980-06-12 JP JP7926280A patent/JPS574501A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS604805A (en) * | 1983-06-23 | 1985-01-11 | Sunstar Giken Kk | Thickness measuring device |
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