JPS5766637A - Exposure device for electron beam - Google Patents

Exposure device for electron beam

Info

Publication number
JPS5766637A
JPS5766637A JP55143314A JP14331480A JPS5766637A JP S5766637 A JPS5766637 A JP S5766637A JP 55143314 A JP55143314 A JP 55143314A JP 14331480 A JP14331480 A JP 14331480A JP S5766637 A JPS5766637 A JP S5766637A
Authority
JP
Japan
Prior art keywords
resolving power
value
lens
coil
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55143314A
Other languages
Japanese (ja)
Inventor
Mamoru Nakasuji
Sadao Sasaki
Mineo Goto
Ryoichi Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55143314A priority Critical patent/JPS5766637A/en
Publication of JPS5766637A publication Critical patent/JPS5766637A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To automatically and easily perform beam focusing and the removal of astigmatism by a method wherein the conductive currents of an objective lens and an astigmatic correcting coil are set at the best value for beam resolving power. CONSTITUTION:An electron detector 11 detecting reflective electrons obtained by irradiating electron beams at a target 10 being prepared by adhering fine grains 10b having high reflective electron detection rate is provided on a substrate 10a. An objective lens 9 and an astigmatic correction coil 8 measuring beam resolving power based on the detection signal in the detector 11 are provided. The conductive current of the lens 9 is variably controlled to obtain the optimum current value for the beam resolving power and the conductive current of the lens 9 is set at the value thus obtained. Similarly, the optimum current valve for the beam resolving power measured by variably controlling the coil 8 is set at the value thus obtained. In this way, beam focusing and the removal of astigmatism can automatically be performed.
JP55143314A 1980-10-14 1980-10-14 Exposure device for electron beam Pending JPS5766637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55143314A JPS5766637A (en) 1980-10-14 1980-10-14 Exposure device for electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55143314A JPS5766637A (en) 1980-10-14 1980-10-14 Exposure device for electron beam

Publications (1)

Publication Number Publication Date
JPS5766637A true JPS5766637A (en) 1982-04-22

Family

ID=15335887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55143314A Pending JPS5766637A (en) 1980-10-14 1980-10-14 Exposure device for electron beam

Country Status (1)

Country Link
JP (1) JPS5766637A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108251A (en) * 1982-12-10 1984-06-22 Hitachi Ltd Astigmatism correction method for electron optical system

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5360178A (en) * 1976-11-10 1978-05-30 Toshiba Corp Target for focusing of electron beam
JPS5492051A (en) * 1977-12-29 1979-07-20 Jeol Ltd Focusing method and its apparatus for electron beam device
JPS54100669A (en) * 1978-01-25 1979-08-08 Jeol Ltd Electron-beam unit
JPS556784A (en) * 1979-03-28 1980-01-18 Jeol Ltd Method and device for astrigmatism correction in scanning electron microscope
JPS5588329A (en) * 1978-12-27 1980-07-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing method for electron beam

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5360178A (en) * 1976-11-10 1978-05-30 Toshiba Corp Target for focusing of electron beam
JPS5492051A (en) * 1977-12-29 1979-07-20 Jeol Ltd Focusing method and its apparatus for electron beam device
JPS54100669A (en) * 1978-01-25 1979-08-08 Jeol Ltd Electron-beam unit
JPS5588329A (en) * 1978-12-27 1980-07-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing method for electron beam
JPS556784A (en) * 1979-03-28 1980-01-18 Jeol Ltd Method and device for astrigmatism correction in scanning electron microscope

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108251A (en) * 1982-12-10 1984-06-22 Hitachi Ltd Astigmatism correction method for electron optical system

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