JPS5776837A - Apparatus for multipile electron beam exposure - Google Patents

Apparatus for multipile electron beam exposure

Info

Publication number
JPS5776837A
JPS5776837A JP55152688A JP15268880A JPS5776837A JP S5776837 A JPS5776837 A JP S5776837A JP 55152688 A JP55152688 A JP 55152688A JP 15268880 A JP15268880 A JP 15268880A JP S5776837 A JPS5776837 A JP S5776837A
Authority
JP
Japan
Prior art keywords
commonly
anode
beam shaping
electron beams
arranged under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55152688A
Other languages
English (en)
Inventor
Tateaki Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP55152688A priority Critical patent/JPS5776837A/ja
Publication of JPS5776837A publication Critical patent/JPS5776837A/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP55152688A 1980-10-30 1980-10-30 Apparatus for multipile electron beam exposure Pending JPS5776837A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55152688A JPS5776837A (en) 1980-10-30 1980-10-30 Apparatus for multipile electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55152688A JPS5776837A (en) 1980-10-30 1980-10-30 Apparatus for multipile electron beam exposure

Publications (1)

Publication Number Publication Date
JPS5776837A true JPS5776837A (en) 1982-05-14

Family

ID=15545949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55152688A Pending JPS5776837A (en) 1980-10-30 1980-10-30 Apparatus for multipile electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5776837A (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262419A (ja) * 1984-06-08 1985-12-25 Matsushita Electric Ind Co Ltd パタ−ン形成装置およびそれを用いた半導体装置の製造方法
JPS63269529A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269527A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269523A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269524A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269522A (ja) * 1987-04-28 1988-11-07 Canon Inc 電子ビ−ム装置
JPS63269526A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269531A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262419A (ja) * 1984-06-08 1985-12-25 Matsushita Electric Ind Co Ltd パタ−ン形成装置およびそれを用いた半導体装置の製造方法
JPS63269529A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269527A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269523A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269524A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269522A (ja) * 1987-04-28 1988-11-07 Canon Inc 電子ビ−ム装置
JPS63269526A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置
JPS63269531A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置

Similar Documents

Publication Publication Date Title
US4194123A (en) Lithographic apparatus
JPS52143776A (en) Electron beam exposure apparatus
JPS5367099A (en) Electron beam shape accelerator
EP0334334A3 (en) Photo-cathode image projection apparatus for patterning a semiconductor device
JPS5750433A (en) Electron beam exposure method
GB1381082A (en) Method and apparatus for selectively exposing a photosensitive surface
ES2020686A6 (es) Canon de electrones para un tubo de rayos catodicos.
JP2946433B2 (ja) イオンビーム制御システム
JPH02121249A (ja) 電子ビーム発生器
JPS5546553A (en) Method of projecting electron beam
JPS6415604A (en) Measuring apparatus for length by electron beam
JPS59119666A (ja) イオンビ−ム照射装置
JPS57206029A (en) Drawing device by electron beam
JPS51130222A (en) A process for producing an electron beam resist image
JPS5691423A (en) Electron beam exposure device
JPS57122528A (en) Drawing system for electron beam exposure apparatus
JPS56104439A (en) Electron beam exposing method
JPS52130570A (en) Electron beam exposing device
JPS6441216A (en) Electron beam lithography equipment
JPS5710932A (en) Beam blanking method in electron beam exposure
JPS5454581A (en) Electron beam exposure apparatus
JPS5437685A (en) Electron beam exposure unit
JPS56162832A (en) Electron beam device and electron beam exposing method
JPS5783030A (en) Exposure of electron beam
JPS52115161A (en) Electron gun for electron beam exposing device