JPS5778140A - Forming method for photoresist film - Google Patents

Forming method for photoresist film

Info

Publication number
JPS5778140A
JPS5778140A JP55154441A JP15444180A JPS5778140A JP S5778140 A JPS5778140 A JP S5778140A JP 55154441 A JP55154441 A JP 55154441A JP 15444180 A JP15444180 A JP 15444180A JP S5778140 A JPS5778140 A JP S5778140A
Authority
JP
Japan
Prior art keywords
thickness
reflectivity
minimizing
resist
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55154441A
Other languages
English (en)
Inventor
Asao Yomo
Ryoichi Yoneyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Hoya Electronics Corp
Original Assignee
Hoya Corp
Hoya Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Corp filed Critical Hoya Corp
Priority to JP55154441A priority Critical patent/JPS5778140A/ja
Publication of JPS5778140A publication Critical patent/JPS5778140A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55154441A 1980-10-31 1980-10-31 Forming method for photoresist film Pending JPS5778140A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55154441A JPS5778140A (en) 1980-10-31 1980-10-31 Forming method for photoresist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55154441A JPS5778140A (en) 1980-10-31 1980-10-31 Forming method for photoresist film

Publications (1)

Publication Number Publication Date
JPS5778140A true JPS5778140A (en) 1982-05-15

Family

ID=15584260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55154441A Pending JPS5778140A (en) 1980-10-31 1980-10-31 Forming method for photoresist film

Country Status (1)

Country Link
JP (1) JPS5778140A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115072U (ja) * 1984-06-29 1986-01-28 ホ−ヤ株式会社 レジスト塗布装置
JPS63237417A (ja) * 1987-03-25 1988-10-03 Nec Yamagata Ltd 半導体装置の製造方法
EP0205148A3 (en) * 1985-06-12 1988-12-28 Hitachi, Ltd. Method of applying a resist

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115072U (ja) * 1984-06-29 1986-01-28 ホ−ヤ株式会社 レジスト塗布装置
EP0205148A3 (en) * 1985-06-12 1988-12-28 Hitachi, Ltd. Method of applying a resist
JPS63237417A (ja) * 1987-03-25 1988-10-03 Nec Yamagata Ltd 半導体装置の製造方法

Similar Documents

Publication Publication Date Title
GB1461685A (en) Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask
JPS5778140A (en) Forming method for photoresist film
JPS5595324A (en) Manufacturing method of semiconductor device
ES8609752A1 (es) Un metodo para obtener una placa de impresion de relieve
JPS57106128A (en) Forming method for pattern
JPS5657035A (en) Positive type photosensitive composition
GB1280625A (en) Method of forming fringe pattern images
JPS5388728A (en) Method of forming pattern
JPS54141573A (en) Mask for exposure
US3069265A (en) Method for photographically producing light balanced dial indicators
JPS5596952A (en) Production of photomask
Iwata et al. Brightness, S/N And Contrast Of A Surface Relief Rainbow Hologram For An Embossing Master
JPS5742043A (en) Photosensitive material
JPS56137634A (en) Pattern forming
GB1407123A (en) Process for the manufacture of offset printing plates
JPS561534A (en) Manufacture of photomask
JPS642050A (en) Pattern forming method
JPS533821A (en) Exposure method
JPS57167619A (en) Number indication of semiconductor substrate
JPS5655950A (en) Photographic etching method
JPS5655046A (en) Formation of resist pattern
JPS54121150A (en) Optical production of blaze grating
JPS5744150A (en) Photomask
JPS5581347A (en) Alignment mechanism
FR1594635A (ja)