JPS5817932B2 - 軸外像伝達光学系 - Google Patents

軸外像伝達光学系

Info

Publication number
JPS5817932B2
JPS5817932B2 JP54077620A JP7762079A JPS5817932B2 JP S5817932 B2 JPS5817932 B2 JP S5817932B2 JP 54077620 A JP54077620 A JP 54077620A JP 7762079 A JP7762079 A JP 7762079A JP S5817932 B2 JPS5817932 B2 JP S5817932B2
Authority
JP
Japan
Prior art keywords
image
mirror
concave mirror
reference axis
convex mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54077620A
Other languages
English (en)
Other versions
JPS5517196A (en
Inventor
アベ・オツフナー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22553496&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPS5817932(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of JPS5517196A publication Critical patent/JPS5517196A/ja
Publication of JPS5817932B2 publication Critical patent/JPS5817932B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G02B17/0636—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B23/00—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
    • G02B23/02—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices involving prisms or mirrors
    • G02B23/06—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices involving prisms or mirrors having a focussing action, e.g. parabolic mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Astronomy & Astrophysics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】 本発明は、単位倍率で物体の像を軸外伝達するための光
学系に関する。
評言すれば本発明は、像が高い解像度で正確な微細デテ
ールで形成される反射光学系（ｃａｔｏｐｔｒｉｃ ｓ
ｙｓｔｅｍ）に関する。
単位倍率もしくは他の倍率で像を作るための種種の光学
系は公知である。
反射光学系では、口径の部分が普通ぼやける。
この結果、これらの系によって作られる像のコントラス
トが失なわれる。
反射光学系における中、０・部のぼやける効果を防ぐた
めにビームスプリッタの使用が提案されているが、大き
いサイズで適切な質の像を作るのが困難でありかつスプ
リッタで導入される散乱が像のコントラストを減少させ
る。
本発明の主目的は、コントラストが均一に高くかつ画側
のすべての部分に対し実質的にコンスタントであり、系
の整列が像形式に使用されるスペクトル領域とは独立で
ある、良好な物体面及び像面を有する、歪曲のない単位
倍率の全反射光学系を得ることである。
要するに、本発明の系は、その曲率中心が単一点で合致
するように配置された凸面の球面鏡と凹面の球面鏡とを
有する。
これらの鏡はそれらの軸共役点が上記の単一点にあるよ
うに配置されかつこの点を含む面内に単位倍率で２つの
軸外共役区域が得られるように配置されており、この系
の基準軸は上記の面に対して垂直な軸であって上記の点
を通る。
これによって、球面収差、コマ収差及び歪曲を有しない
系が得られかつ適切な口径と像野を有する基本型の系に
対し回折の制限された使月形が得られる。
本発明の反射光学系においては、半径方向の像面はすべ
ての次数の収差に対して平坦であり、従って子午的像野
の三次歪曲の大きさは、利用される反射面の発散力又は
収斂力（焦点距離の逆数）の代数和の２倍に等しい。
下記の例示的実施例の若干において、２つ以上の反射面
は実際に単−鏡の部分であり、この場合にはそれぞれの
反射は分離鏡によって得ることのできることが認められ
る。
また、発散又は収斂力の和の決定においては、各反射面
部分の拡大力がその面部分からのそれぞれの反射ごとに
加えられる。
評言すれば本発明の光学系においては、基準軸を中心に
回転対称に１個の凹面鏡と１個の凸面鏡を有し、凹面鏡
と凸面鏡とは、系を通る光線が凹面鏡及び凸面鏡から交
互に反射し、凸面鏡から２回、凹面鏡から３回の反射を
行なうように配置されている。
該系は、基準軸から等距離のそれぞれの共役位置に、基
準軸に対して直角の面内に物体位置を有し、かつ基準軸
に対して直角の面内に像位置を有する。
さらに、該系は像野及び物体野を、実質的に基準軸を中
心とするアーチ形区域又はかかる区域の像の全部もしく
は一部に制限する装置を有する。
凸面鏡は凹面鏡の凶に相当する半径を有しかつ凹面鏡に
向かい合って配置され、第１鏡のアペックスは系の軸に
対して平行で第１鏡である凹面鏡から反射され、次いで
第２鏡である凸面鏡から反射される光線が凹面鏡と物体
位置又は像位置との間の空間内で系と交わるような位置
に置かれていて、系は像空間及び物体空間の双方におい
てテレセンドリンクであり、従って物体位置に関してア
フォーカルであり、利用される反射面の発散又は収斂力
の代数和はゼロであって像位置に、物体位置にある物体
の実質的に収差のない像を作る。
また、本発明による系は受像面を像野に対し相対的に動
かすための装置をも有する。
次に図面につき本発明を詳述する。
図示の実施例では、凸面鏡４０と凹面鏡４１とが点Ｐを
中心に、系内で合計５回の反射（凹面鏡４１から３回、
凸面鏡４０から２回の反射）を生じるように配置されて
いる。
これらの鏡はその曲率中心が点Ｐにおいて一致し、かつ
点Ｏ及び工を中心とする軸外共役区域を有するように配
置されており、点Ｏ及び■はそれぞれ基準軸ＳＡの反対
側にある。
凹面鏡４１は■に物点Ｏの像を作り、凸面鏡４０は点０
に点■の虚像を作り、これは凹面鏡４１によって■に再
び結像される。
凸面鏡４００半径が凹面鏡４１０半径の２／３である場
合、利用される反射面の拡大力の代数和はゼロであり；
従って系はすべての三次収差に対して補正され、三次収
差だけが鏡に向って凹面の子午的像野の歪曲である。
【図面の簡単な説明】
図は本発明による像伝達光学系の１実施例の説明図であ
る。 Ｏ・・・・・・物点、■・・・・・・像点、ＳＡ・・・
・・・系の基準軸、Ｐ・・・・・・曲率中心、４０・・
・・・・凸面鏡、４１・・・・・・凹面応

Claims (1)

    【特許請求の範囲】
  1. １ 基準軸を中心に回転対称に１個の凹面鏡と１個の凸
    面鏡を有し、凹面鏡と凸面鏡とは、系を通る光線が凹面
    鏡及び凸面鏡から交互に反射し、凸面鏡から２回、凹面
    鏡から３回の反射を行なうように配置されていて、基準
    軸から等距離のそれぞれの共役位置に、基準軸に対して
    直角の面内に物体位置を有しかつ基準軸に対して直角の
    面内に像位置を有し、像野及び物体野を、実質的に基準
    軸を中心とするアーチ形区域又はかかる区域の像の全部
    又は一部に制限する装置を有し、凸面鏡は凹面鏡の２／
    ３に相当する半径を有しかつ凹面鏡に向かい合って配置
    され、第１鏡のアペックスは系の軸に対して平行で第１
    鏡である凹面鏡から反射され、次いで第２鏡である凸面
    鏡から反射される光線が凹面鏡と物体位置又は像位置と
    の間の空間内で系と交わるような位置に置かれていて、
    系は像空間と物体空間の双方においてテレセンドリンク
    であり、従って物体位置に関してアフォーカルであり、
    利用される反射面の発散力又は収斂力の代数和はゼロで
    あって像位置に、物体位置にある物体の実質的に収差の
    ない像を作り、かつ受像面を像野に対し相対的に動かす
    装置を有することを特徴とする軸外像伝達光学系。
JP54077620A 1971-06-21 1979-06-21 軸外像伝達光学系 Expired JPS5817932B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15494871A 1971-06-21 1971-06-21

Publications (2)

Publication Number Publication Date
JPS5517196A JPS5517196A (en) 1980-02-06
JPS5817932B2 true JPS5817932B2 (ja) 1983-04-11

Family

ID=22553496

Family Applications (3)

Application Number Title Priority Date Filing Date
JP47062278A Pending JPS5751083B1 (ja) 1971-06-21 1972-06-21
JP54077621A Expired JPS5817933B2 (ja) 1971-06-21 1979-06-21 軸外像伝達光学系
JP54077620A Expired JPS5817932B2 (ja) 1971-06-21 1979-06-21 軸外像伝達光学系

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP47062278A Pending JPS5751083B1 (ja) 1971-06-21 1972-06-21
JP54077621A Expired JPS5817933B2 (ja) 1971-06-21 1979-06-21 軸外像伝達光学系

Country Status (13)

Country Link
US (1) US3748015A (ja)
JP (3) JPS5751083B1 (ja)
KR (1) KR790000468B1 (ja)
BR (1) BR7203998D0 (ja)
CA (1) CA970611A (ja)
CH (1) CH552222A (ja)
DE (1) DE2230002C2 (ja)
FR (1) FR2143493B1 (ja)
GB (1) GB1401687A (ja)
IL (1) IL39693A (ja)
IT (1) IT956732B (ja)
NL (3) NL176711C (ja)
SE (1) SE383423B (ja)

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IL39693A0 (en) 1972-08-30
IT956732B (it) 1973-10-10
SE383423B (sv) 1976-03-08
DE2230002A1 (de) 1973-01-11
NL8401001A (nl) 1984-07-02
NL8401002A (nl) 1984-07-02
FR2143493B1 (ja) 1977-12-23
DE2230002C2 (de) 1984-11-22
US3748015A (en) 1973-07-24
GB1401687A (en) 1975-07-30
NL176711B (nl) 1984-12-17
JPS5517197A (en) 1980-02-06
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NL176711C (nl) 1985-05-17
CA970611A (en) 1975-07-08
FR2143493A1 (ja) 1973-02-02
IL39693A (en) 1975-02-10
JPS5517196A (en) 1980-02-06
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JPS5751083B1 (ja) 1982-10-30
JPS5817933B2 (ja) 1983-04-11

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