JPS58187012A - 弾性表面波デバイスの製造方法 - Google Patents

弾性表面波デバイスの製造方法

Info

Publication number
JPS58187012A
JPS58187012A JP6960882A JP6960882A JPS58187012A JP S58187012 A JPS58187012 A JP S58187012A JP 6960882 A JP6960882 A JP 6960882A JP 6960882 A JP6960882 A JP 6960882A JP S58187012 A JPS58187012 A JP S58187012A
Authority
JP
Japan
Prior art keywords
electrode
acoustic wave
short
surface acoustic
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6960882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH029724B2 (fr
Inventor
Kiyobumi Yamashita
山下 清文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6960882A priority Critical patent/JPS58187012A/ja
Publication of JPS58187012A publication Critical patent/JPS58187012A/ja
Publication of JPH029724B2 publication Critical patent/JPH029724B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
JP6960882A 1982-04-27 1982-04-27 弾性表面波デバイスの製造方法 Granted JPS58187012A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6960882A JPS58187012A (ja) 1982-04-27 1982-04-27 弾性表面波デバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6960882A JPS58187012A (ja) 1982-04-27 1982-04-27 弾性表面波デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPS58187012A true JPS58187012A (ja) 1983-11-01
JPH029724B2 JPH029724B2 (fr) 1990-03-05

Family

ID=13407732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6960882A Granted JPS58187012A (ja) 1982-04-27 1982-04-27 弾性表面波デバイスの製造方法

Country Status (1)

Country Link
JP (1) JPS58187012A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257008A (ja) * 1985-05-10 1986-11-14 Toshiba Corp 弾性表面波装置の製造方法
JP2011071967A (ja) * 2009-08-24 2011-04-07 Ngk Insulators Ltd 複合基板の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55157321U (fr) * 1979-04-02 1980-11-12
JPS5843607A (ja) * 1981-09-09 1983-03-14 Hitachi Ltd 表面弾性波フイルタの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55157321U (fr) * 1979-04-02 1980-11-12
JPS5843607A (ja) * 1981-09-09 1983-03-14 Hitachi Ltd 表面弾性波フイルタの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257008A (ja) * 1985-05-10 1986-11-14 Toshiba Corp 弾性表面波装置の製造方法
JP2011071967A (ja) * 2009-08-24 2011-04-07 Ngk Insulators Ltd 複合基板の製造方法

Also Published As

Publication number Publication date
JPH029724B2 (fr) 1990-03-05

Similar Documents

Publication Publication Date Title
JP3470031B2 (ja) 弾性表面波装置の製造方法
JPH01129517A (ja) 表面波共振素子の製造方法
JPH09199974A (ja) 弾性表面波装置
US4684841A (en) Saw devices including resistive films
JPS58187012A (ja) 弾性表面波デバイスの製造方法
JP3858312B2 (ja) 表面弾性波素子およびその製造方法
EP0200304B1 (fr) Dispositif à ondes acoustiques de surface comportant des films résistifs
JP2565880B2 (ja) 弾性表面波装置の製造方法
JPH10190389A (ja) Sawフィルタ及びその製造方法
US3959748A (en) Dual sidestepping SWIF and method
JP2007049482A (ja) 弾性境界波素子
CN121098264B (zh) 滤波器的形成方法
JPS61257008A (ja) 弾性表面波装置の製造方法
JPS5910085B2 (ja) 弾性表面波デバイスの製造方法
JPH11195947A (ja) 弾性表面波装置の製造方法
JPH04369915A (ja) 弾性表面波装置
KR100568302B1 (ko) Saw 소자의 제조방법
JPS5852370B2 (ja) 弾性表面波素子
JPS63178615A (ja) 弾性表面波素子の製造方法
JPS5985115A (ja) 弾性表面波素子の製造方法
JPS58215110A (ja) 弾性表面波フイルタ−素子の製造方法
JPS61251221A (ja) 導体パタ−ンの製造方法
JP2007053670A (ja) 弾性境界波素子
JPH09162670A (ja) 弾性表面波デバイス及びそのパターン形成方法
JPS60117807A (ja) 表面波フィルタの帯域調整方法