JPS586131A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS586131A
JPS586131A JP56104018A JP10401881A JPS586131A JP S586131 A JPS586131 A JP S586131A JP 56104018 A JP56104018 A JP 56104018A JP 10401881 A JP10401881 A JP 10401881A JP S586131 A JPS586131 A JP S586131A
Authority
JP
Japan
Prior art keywords
marks
wafer
electron beam
irradiated
chips
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56104018A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328049B2 (de
Inventor
Takayuki Miyazaki
宮崎　隆之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56104018A priority Critical patent/JPS586131A/ja
Publication of JPS586131A publication Critical patent/JPS586131A/ja
Publication of JPH0328049B2 publication Critical patent/JPH0328049B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56104018A 1981-07-03 1981-07-03 電子ビ−ム露光方法 Granted JPS586131A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56104018A JPS586131A (ja) 1981-07-03 1981-07-03 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56104018A JPS586131A (ja) 1981-07-03 1981-07-03 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS586131A true JPS586131A (ja) 1983-01-13
JPH0328049B2 JPH0328049B2 (de) 1991-04-17

Family

ID=14369513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56104018A Granted JPS586131A (ja) 1981-07-03 1981-07-03 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS586131A (de)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5452223A (en) * 1977-10-03 1979-04-24 Toyota Motor Corp Exhaust gas recirculating system for operation of internal-combustion engine at high ground
JPS5538117U (de) * 1978-08-30 1980-03-11

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5452223A (en) * 1977-10-03 1979-04-24 Toyota Motor Corp Exhaust gas recirculating system for operation of internal-combustion engine at high ground
JPS5538117U (de) * 1978-08-30 1980-03-11

Also Published As

Publication number Publication date
JPH0328049B2 (de) 1991-04-17

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