JPS60134419A - 荷電粒子線露光装置 - Google Patents

荷電粒子線露光装置

Info

Publication number
JPS60134419A
JPS60134419A JP58242709A JP24270983A JPS60134419A JP S60134419 A JPS60134419 A JP S60134419A JP 58242709 A JP58242709 A JP 58242709A JP 24270983 A JP24270983 A JP 24270983A JP S60134419 A JPS60134419 A JP S60134419A
Authority
JP
Japan
Prior art keywords
shot
time
amplifier
signal
shot time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58242709A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0357609B2 (de
Inventor
Hitoshi Sato
仁 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NTT Inc
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP58242709A priority Critical patent/JPS60134419A/ja
Publication of JPS60134419A publication Critical patent/JPS60134419A/ja
Publication of JPH0357609B2 publication Critical patent/JPH0357609B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58242709A 1983-12-22 1983-12-22 荷電粒子線露光装置 Granted JPS60134419A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58242709A JPS60134419A (ja) 1983-12-22 1983-12-22 荷電粒子線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58242709A JPS60134419A (ja) 1983-12-22 1983-12-22 荷電粒子線露光装置

Publications (2)

Publication Number Publication Date
JPS60134419A true JPS60134419A (ja) 1985-07-17
JPH0357609B2 JPH0357609B2 (de) 1991-09-02

Family

ID=17093074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58242709A Granted JPS60134419A (ja) 1983-12-22 1983-12-22 荷電粒子線露光装置

Country Status (1)

Country Link
JP (1) JPS60134419A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62125617A (ja) * 1985-11-26 1987-06-06 Toshiba Corp 荷電ビ−ム描画方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5358770A (en) * 1976-11-08 1978-05-26 Jeol Ltd Electron beam exposure apparatus
JPS558004A (en) * 1978-06-30 1980-01-21 Hitachi Ltd Electronic beam deviation control device
JPS5721822A (en) * 1980-07-16 1982-02-04 Jeol Ltd Exposing method for electron beam

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5358770A (en) * 1976-11-08 1978-05-26 Jeol Ltd Electron beam exposure apparatus
JPS558004A (en) * 1978-06-30 1980-01-21 Hitachi Ltd Electronic beam deviation control device
JPS5721822A (en) * 1980-07-16 1982-02-04 Jeol Ltd Exposing method for electron beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62125617A (ja) * 1985-11-26 1987-06-06 Toshiba Corp 荷電ビ−ム描画方法

Also Published As

Publication number Publication date
JPH0357609B2 (de) 1991-09-02

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term