JPH0357609B2 - - Google Patents

Info

Publication number
JPH0357609B2
JPH0357609B2 JP58242709A JP24270983A JPH0357609B2 JP H0357609 B2 JPH0357609 B2 JP H0357609B2 JP 58242709 A JP58242709 A JP 58242709A JP 24270983 A JP24270983 A JP 24270983A JP H0357609 B2 JPH0357609 B2 JP H0357609B2
Authority
JP
Japan
Prior art keywords
shot
time
signal
shot time
amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58242709A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60134419A (ja
Inventor
Hitoshi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP58242709A priority Critical patent/JPS60134419A/ja
Publication of JPS60134419A publication Critical patent/JPS60134419A/ja
Publication of JPH0357609B2 publication Critical patent/JPH0357609B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58242709A 1983-12-22 1983-12-22 荷電粒子線露光装置 Granted JPS60134419A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58242709A JPS60134419A (ja) 1983-12-22 1983-12-22 荷電粒子線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58242709A JPS60134419A (ja) 1983-12-22 1983-12-22 荷電粒子線露光装置

Publications (2)

Publication Number Publication Date
JPS60134419A JPS60134419A (ja) 1985-07-17
JPH0357609B2 true JPH0357609B2 (de) 1991-09-02

Family

ID=17093074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58242709A Granted JPS60134419A (ja) 1983-12-22 1983-12-22 荷電粒子線露光装置

Country Status (1)

Country Link
JP (1) JPS60134419A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0673343B2 (ja) * 1985-11-26 1994-09-14 株式会社東芝 荷電ビ−ム描画方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6038020B2 (ja) * 1976-11-08 1985-08-29 日本電子株式会社 電子線露光装置
JPS558004A (en) * 1978-06-30 1980-01-21 Hitachi Ltd Electronic beam deviation control device
JPS5721822A (en) * 1980-07-16 1982-02-04 Jeol Ltd Exposing method for electron beam

Also Published As

Publication number Publication date
JPS60134419A (ja) 1985-07-17

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term