JPS60175051A - 半導体焼付方法 - Google Patents

半導体焼付方法

Info

Publication number
JPS60175051A
JPS60175051A JP59029511A JP2951184A JPS60175051A JP S60175051 A JPS60175051 A JP S60175051A JP 59029511 A JP59029511 A JP 59029511A JP 2951184 A JP2951184 A JP 2951184A JP S60175051 A JPS60175051 A JP S60175051A
Authority
JP
Japan
Prior art keywords
wafer
mask
alignment
exposure
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59029511A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0542807B2 (mo
Inventor
Koji Uda
宇田　幸二
Kazuyuki Oda
和幸 小田
Naoki Ayada
綾田　直樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59029511A priority Critical patent/JPS60175051A/ja
Priority to US06/701,623 priority patent/US4669867A/en
Publication of JPS60175051A publication Critical patent/JPS60175051A/ja
Publication of JPH0542807B2 publication Critical patent/JPH0542807B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59029511A 1984-02-20 1984-02-21 半導体焼付方法 Granted JPS60175051A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59029511A JPS60175051A (ja) 1984-02-21 1984-02-21 半導体焼付方法
US06/701,623 US4669867A (en) 1984-02-20 1985-02-14 Alignment and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59029511A JPS60175051A (ja) 1984-02-21 1984-02-21 半導体焼付方法

Publications (2)

Publication Number Publication Date
JPS60175051A true JPS60175051A (ja) 1985-09-09
JPH0542807B2 JPH0542807B2 (mo) 1993-06-29

Family

ID=12278120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59029511A Granted JPS60175051A (ja) 1984-02-20 1984-02-21 半導体焼付方法

Country Status (1)

Country Link
JP (1) JPS60175051A (mo)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55135831A (en) * 1979-04-03 1980-10-23 Optimetrix Corp Improved stepprepetion projectionnmatching exposer
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55135831A (en) * 1979-04-03 1980-10-23 Optimetrix Corp Improved stepprepetion projectionnmatching exposer
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device

Also Published As

Publication number Publication date
JPH0542807B2 (mo) 1993-06-29

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term