JPH0542807B2 - - Google Patents

Info

Publication number
JPH0542807B2
JPH0542807B2 JP59029511A JP2951184A JPH0542807B2 JP H0542807 B2 JPH0542807 B2 JP H0542807B2 JP 59029511 A JP59029511 A JP 59029511A JP 2951184 A JP2951184 A JP 2951184A JP H0542807 B2 JPH0542807 B2 JP H0542807B2
Authority
JP
Japan
Prior art keywords
wafer
amount
mask
alignment
positional deviation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59029511A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60175051A (ja
Inventor
Koji Uda
Kazuyuki Oda
Naoki Ayada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59029511A priority Critical patent/JPS60175051A/ja
Priority to US06/701,623 priority patent/US4669867A/en
Publication of JPS60175051A publication Critical patent/JPS60175051A/ja
Publication of JPH0542807B2 publication Critical patent/JPH0542807B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59029511A 1984-02-20 1984-02-21 半導体焼付方法 Granted JPS60175051A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59029511A JPS60175051A (ja) 1984-02-21 1984-02-21 半導体焼付方法
US06/701,623 US4669867A (en) 1984-02-20 1985-02-14 Alignment and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59029511A JPS60175051A (ja) 1984-02-21 1984-02-21 半導体焼付方法

Publications (2)

Publication Number Publication Date
JPS60175051A JPS60175051A (ja) 1985-09-09
JPH0542807B2 true JPH0542807B2 (mo) 1993-06-29

Family

ID=12278120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59029511A Granted JPS60175051A (ja) 1984-02-20 1984-02-21 半導体焼付方法

Country Status (1)

Country Link
JP (1) JPS60175051A (mo)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55135831A (en) * 1979-04-03 1980-10-23 Optimetrix Corp Improved stepprepetion projectionnmatching exposer
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device

Also Published As

Publication number Publication date
JPS60175051A (ja) 1985-09-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term