JPS60232998A - 平版印刷版用支持体 - Google Patents

平版印刷版用支持体

Info

Publication number: JPS60232998A
Authority: JP; Japan
Prior art keywords: compound; plate; lithographic printing; base; hydrophilic
Prior art date: 1984-05-04
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP8962784A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0532238B2 (de

Inventor

Shuichi Takamiya

周一高宮

Hirokazu Sakaki

榊　博和

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Holdings Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-05-04

Filing date

1984-05-04

Publication date

1985-11-19

1984-05-04 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

1984-05-04 Priority to JP8962784A priority Critical patent/JPS60232998A/ja

1985-01-16 Priority to EP85100389A priority patent/EP0149490B2/de

1985-01-16 Priority to DE8585100389T priority patent/DE3569703D1/de

1985-11-19 Publication of JPS60232998A publication Critical patent/JPS60232998A/ja

1987-04-21 Priority to US07/042,619 priority patent/US4801527A/en

1993-05-14 Publication of JPH0532238B2 publication Critical patent/JPH0532238B2/ja

Status Granted legal-status Critical Current

Links

238000007639 printing Methods 0.000 claims abstract description 40
229910052782 aluminium Inorganic materials 0.000 claims abstract description 26
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 26
150000001875 compounds Chemical class 0.000 claims abstract description 15
150000003839 salts Chemical class 0.000 claims abstract description 7
125000003277 amino group Chemical group 0.000 claims abstract description 4
238000000576 coating method Methods 0.000 claims description 10
239000011248 coating agent Substances 0.000 claims description 9
150000002433 hydrophilic molecules Chemical class 0.000 abstract description 8
125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 7
GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 abstract description 4
239000010407 anodic oxide Substances 0.000 abstract description 4
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 1
238000010276 construction Methods 0.000 abstract 1
238000000034 method Methods 0.000 description 25
239000000203 mixture Substances 0.000 description 15
229920005989 resin Polymers 0.000 description 14
239000011347 resin Substances 0.000 description 14
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
238000011282 treatment Methods 0.000 description 13
239000000758 substrate Substances 0.000 description 10
229920001577 copolymer Polymers 0.000 description 9
239000007864 aqueous solution Substances 0.000 description 8
238000001035 drying Methods 0.000 description 7
239000000243 solution Substances 0.000 description 7
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
-1 groups Chemical group 0.000 description 6
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
150000008049 diazo compounds Chemical class 0.000 description 5
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 5
239000003792 electrolyte Substances 0.000 description 5
238000010186 staining Methods 0.000 description 5
LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
238000007743 anodising Methods 0.000 description 4
239000011230 binding agent Substances 0.000 description 4
WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
239000000178 monomer Substances 0.000 description 4
238000005498 polishing Methods 0.000 description 4
238000005406 washing Methods 0.000 description 4
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
239000002253 acid Substances 0.000 description 3
239000007795 chemical reaction product Substances 0.000 description 3
238000012937 correction Methods 0.000 description 3
230000000694 effects Effects 0.000 description 3
239000007788 liquid Substances 0.000 description 3
238000007788 roughening Methods 0.000 description 3
229960004418 trolamine Drugs 0.000 description 3
KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
GJMPSRSMBJLKKB-UHFFFAOYSA-N 3-methylphenylacetic acid Chemical compound CC1=CC=CC(CC(O)=O)=C1 GJMPSRSMBJLKKB-UHFFFAOYSA-N 0.000 description 2
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
229910000838 Al alloy Inorganic materials 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
239000004372 Polyvinyl alcohol Substances 0.000 description 2
239000004115 Sodium Silicate Substances 0.000 description 2
230000002378 acidificating effect Effects 0.000 description 2
150000001298 alcohols Chemical class 0.000 description 2
239000003513 alkali Substances 0.000 description 2
229910052910 alkali metal silicate Inorganic materials 0.000 description 2
239000001913 cellulose Substances 0.000 description 2
229920002678 cellulose Polymers 0.000 description 2
238000011109 contamination Methods 0.000 description 2
238000011161 development Methods 0.000 description 2
239000012954 diazonium Substances 0.000 description 2
DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
150000002148 esters Chemical class 0.000 description 2
239000000463 material Substances 0.000 description 2
YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
229910001507 metal halide Inorganic materials 0.000 description 2
150000005309 metal halides Chemical class 0.000 description 2
239000003960 organic solvent Substances 0.000 description 2
229920001568 phenolic resin Polymers 0.000 description 2
238000006116 polymerization reaction Methods 0.000 description 2
229920002451 polyvinyl alcohol Polymers 0.000 description 2
229910052911 sodium silicate Inorganic materials 0.000 description 2
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
229940117957 triethanolamine hydrochloride Drugs 0.000 description 2
FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
AIMOGYBQVOZZCZ-UHFFFAOYSA-N 2-methylprop-2-enoic acid 3-phenylprop-2-enoic acid Chemical compound C(C(=C)C)(=O)O.C(C=CC1=CC=CC=C1)(=O)O AIMOGYBQVOZZCZ-UHFFFAOYSA-N 0.000 description 1
ASLOMEPLDWVVRG-UHFFFAOYSA-N 3-phenylprop-2-enoic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=CC1=CC=CC=C1 ASLOMEPLDWVVRG-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
239000004677 Nylon Substances 0.000 description 1
229910019142 PO4 Inorganic materials 0.000 description 1
ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
239000004698 Polyethylene Substances 0.000 description 1
OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
102100021555 RNA cytosine C(5)-methyltransferase NSUN2 Human genes 0.000 description 1
101710173722 RNA cytosine C(5)-methyltransferase NSUN2 Proteins 0.000 description 1
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
238000003723 Smelting Methods 0.000 description 1
229920002125 Sokalan® Polymers 0.000 description 1
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
ZZAGLMPBQOKGGT-UHFFFAOYSA-N [4-[4-(4-prop-2-enoyloxybutoxy)benzoyl]oxyphenyl] 4-(4-prop-2-enoyloxybutoxy)benzoate Chemical compound C1=CC(OCCCCOC(=O)C=C)=CC=C1C(=O)OC(C=C1)=CC=C1OC(=O)C1=CC=C(OCCCCOC(=O)C=C)C=C1 ZZAGLMPBQOKGGT-UHFFFAOYSA-N 0.000 description 1
ITBPIKUGMIZTJR-UHFFFAOYSA-N [bis(hydroxymethyl)amino]methanol Chemical compound OCN(CO)CO ITBPIKUGMIZTJR-UHFFFAOYSA-N 0.000 description 1
CSCPPACGZOOCGX-UHFFFAOYSA-N acetone Substances CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
150000007824 aliphatic compounds Chemical class 0.000 description 1
125000005250 alkyl acrylate group Chemical group 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
239000000956 alloy Substances 0.000 description 1
229910000147 aluminium phosphate Inorganic materials 0.000 description 1
239000007900 aqueous suspension Substances 0.000 description 1
150000001491 aromatic compounds Chemical class 0.000 description 1
125000003118 aryl group Chemical group 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
150000004653 carbonic acids Chemical class 0.000 description 1
239000001768 carboxy methyl cellulose Substances 0.000 description 1
235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
239000008112 carboxymethyl-cellulose Substances 0.000 description 1
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
229940114081 cinnamate Drugs 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
239000007859 condensation product Substances 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
238000007766 curtain coating Methods 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
238000005238 degreasing Methods 0.000 description 1
FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
150000001989 diazonium salts Chemical class 0.000 description 1
239000000539 dimer Substances 0.000 description 1
238000003618 dip coating Methods 0.000 description 1
238000002848 electrochemical method Methods 0.000 description 1
238000005868 electrolysis reaction Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
238000005530 etching Methods 0.000 description 1
KBEBGUQPQBELIU-UHFFFAOYSA-N ethyl 3-phenylprop-2-enoate Chemical compound CCOC(=O)C=CC1=CC=CC=C1 KBEBGUQPQBELIU-UHFFFAOYSA-N 0.000 description 1
VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 1
AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
238000007654 immersion Methods 0.000 description 1
239000003112 inhibitor Substances 0.000 description 1
239000003999 initiator Substances 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
229910052749 magnesium Inorganic materials 0.000 description 1
239000011777 magnesium Substances 0.000 description 1
VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
239000011976 maleic acid Substances 0.000 description 1
WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
238000010297 mechanical methods and process Methods 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
238000006386 neutralization reaction Methods 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
FGHSTPNOXKDLKU-UHFFFAOYSA-N nitric acid;hydrate Chemical compound O.O[N+]([O-])=O FGHSTPNOXKDLKU-UHFFFAOYSA-N 0.000 description 1
229920003986 novolac Polymers 0.000 description 1
229920001778 nylon Polymers 0.000 description 1
229920000620 organic polymer Polymers 0.000 description 1
150000003891 oxalate salts Chemical class 0.000 description 1
235000006408 oxalic acid Nutrition 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
NBFNGRDFKUJVIN-VAWYXSNFSA-N phenyl (e)-3-phenylprop-2-enoate Chemical compound C=1C=CC=CC=1/C=C/C(=O)OC1=CC=CC=C1 NBFNGRDFKUJVIN-VAWYXSNFSA-N 0.000 description 1
235000021317 phosphate Nutrition 0.000 description 1
150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
229920001225 polyester resin Polymers 0.000 description 1
239000004645 polyester resin Substances 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
238000012545 processing Methods 0.000 description 1
QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
239000010731 rolling oil Substances 0.000 description 1
238000006748 scratching Methods 0.000 description 1
230000002393 scratching effect Effects 0.000 description 1
150000003335 secondary amines Chemical group 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
235000011121 sodium hydroxide Nutrition 0.000 description 1
239000002904 solvent Substances 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
238000005507 spraying Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
150000005846 sugar alcohols Polymers 0.000 description 1
125000000542 sulfonic acid group Chemical group 0.000 description 1
230000003746 surface roughness Effects 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1
230000002522 swelling effect Effects 0.000 description 1
125000001302 tertiary amino group Chemical group 0.000 description 1
238000012719 thermal polymerization Methods 0.000 description 1
239000010936 titanium Substances 0.000 description 1
229910052719 titanium Inorganic materials 0.000 description 1
VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
229910052724 xenon Inorganic materials 0.000 description 1
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces

Landscapes

Printing Plates And Materials Therefor (AREA)

JP8962784A 1984-01-17 1984-05-04 平版印刷版用支持体 Granted JPS60232998A (ja)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
JP8962784A JPS60232998A (ja)	1984-05-04	1984-05-04	平版印刷版用支持体
EP85100389A EP0149490B2 (de)	1984-01-17	1985-01-16	Vorsensibilisierte anodisierte Aluminiumdruckplatte mit hydrophiler Schicht
DE8585100389T DE3569703D1 (en)	1984-01-17	1985-01-16	Presensitized plate having an anodized aluminum base with an improved hydrophilic layer
US07/042,619 US4801527A (en)	1984-01-17	1987-04-21	Presensitized O-quinone diazide plate having an anodized aluminum base with an amine compound containing hydrophilic layer

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP8962784A JPS60232998A (ja)	1984-05-04	1984-05-04	平版印刷版用支持体

Publications (2)

Publication Number	Publication Date
JPS60232998A true JPS60232998A (ja)	1985-11-19
JPH0532238B2 JPH0532238B2 (de)	1993-05-14

Family

ID=13975989

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP8962784A Granted JPS60232998A (ja)	1984-01-17	1984-05-04	平版印刷版用支持体

Country Status (1)

Country	Link
JP (1)	JPS60232998A (de)

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS63130391A (ja) *	1986-11-20	1988-06-02	Fuji Photo Film Co Ltd	平版印刷版用支持体
JPS63165183A (ja) *	1986-12-26	1988-07-08	Fuji Photo Film Co Ltd	平版印刷版用支持体
JPH01186967A (ja) *	1988-01-20	1989-07-26	Fuji Photo Film Co Ltd	電子写真式製版用印刷版
JPH0239154A (ja) *	1988-07-29	1990-02-08	Fuji Photo Film Co Ltd	感光性平版印刷版
EP0565006A2 (de)	1992-04-06	1993-10-13	Fuji Photo Film Co., Ltd.	Verfahren zur Herstellung einer vorsensibilisierten Platte
EP1619023A2 (de)	2004-07-20	2006-01-25	Fuji Photo Film Co., Ltd.	Bilderzeugendes Material
EP1629975A1 (de)	2004-08-27	2006-03-01	Fuji Photo Film Co., Ltd.	Flachdruckplattenvorläufer sowie Verfahren zur Herstellung einer Flachdruckplatte
EP1637324A2 (de)	2004-08-26	2006-03-22	Fuji Photo Film Co., Ltd.	Farbiges Bilderzeugungsmaterial und lithographischer Druckplattenvorläufer
EP1669195A1 (de)	2004-12-13	2006-06-14	Fuji Photo Film Co., Ltd.	Flachdruckverfahren
EP1701213A2 (de)	2005-03-08	2006-09-13	Fuji Photo Film Co., Ltd.	Lichtempfindliche Zusammensetzung
EP1705002A1 (de)	2005-03-23	2006-09-27	Fuji Photo Film Co., Ltd.	Flachdruckplattenvorläufer und Verfahren zur Herstellung der Druckplatte
EP1707353A2 (de)	2005-03-29	2006-10-04	Fuji Photo Film Co., Ltd.	Flachdruckplattenvorläufer mit Bildaufzeichnungsschicht mit Infrarotstrahlenabsorbens, Polymerisationsinitiator, polymerisierbarer Verbindung und Thiolverbindung
EP1708025A1 (de)	2005-03-25	2006-10-04	Fuji Photo Film Co., Ltd.	Lichtempfindliche Lithografiedruckform
EP1710627A1 (de)	2005-03-28	2006-10-11	Fuji Photo Film Co., Ltd.	Lichtempfindliche Lithografiedruckform
EP1757984A1 (de)	2005-08-22	2007-02-28	Fuji Photo Film Co., Ltd.	Lichtempfindliche Lithografiedruckform
JP2008050409A (ja) *	2006-08-22	2008-03-06	Nicca Chemical Co Ltd	アルミニウム材用表面防汚剤、アルミニウム材の防汚処理方法及びアルミニウム材構造物
EP1930770A2 (de)	2006-12-07	2008-06-11	FUJIFILM Corporation	Bildgebungsaufzeichnungsmaterial und neue Verbindung
EP1972438A1 (de)	2007-03-20	2008-09-24	FUJIFILM Corporation	Lithographiedruckplattenvorläufer und Verfahren zur Vorbereitung einer Lithographiedruckplatte
EP1975707A1 (de)	2007-03-27	2008-10-01	Fujifilm Corporation	Härtbare Zusammensetzung und Flachdruckplattenvorläufer
EP2042309A2 (de)	2007-09-28	2009-04-01	FUJIFILM Corporation	Verfahren zur Herstellung einer Negativflachdruckplatte
EP2042306A2 (de)	2007-09-28	2009-04-01	FUJIFILM Corporation	Planografischer Druckplatten-Vorläufer und Verfahren zur Herstellung eines Copolymers, das darin verwendet wird
EP2042532A2 (de)	2007-09-28	2009-04-01	FUJIFILM Corporation	Polymerisierbare Zusammensetzung und Flachdruckplattenvorläufer damit, alkalilösliches Polyurethanharz sowie Verfahren zur Herstellung einer Diolverbindung
EP2042340A2 (de)	2007-09-27	2009-04-01	Fujifilm Corporation	Mittel zum Schutz der Oberfläche einer lithografischen Druckplatte und Plattenherstellungsverfahren für Lithografiedruckplatten
EP2204698A1 (de)	2009-01-06	2010-07-07	FUJIFILM Corporation	Plattenoberflächenbehandlungsmittel für eine lithografische Druckplatte und Verfahren zur Behandlung der lithografischen Druckplatte
WO2013039235A1 (ja)	2011-09-15	2013-03-21	富士フイルム株式会社	製版処理廃液のリサイクル方法
WO2013065853A1 (ja)	2011-11-04	2013-05-10	富士フイルム株式会社	製版処理廃液のリサイクル方法
EP3051349A1 (de)	2003-07-29	2016-08-03	FUJIFILM Corporation	Alkalilösliches polymer und polymerisierbare zusammensetzung dafür

1984
- 1984-05-04 JP JP8962784A patent/JPS60232998A/ja active Granted

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS63130391A (ja) *	1986-11-20	1988-06-02	Fuji Photo Film Co Ltd	平版印刷版用支持体
JPS63165183A (ja) *	1986-12-26	1988-07-08	Fuji Photo Film Co Ltd	平版印刷版用支持体
JPH01186967A (ja) *	1988-01-20	1989-07-26	Fuji Photo Film Co Ltd	電子写真式製版用印刷版
JPH0239154A (ja) *	1988-07-29	1990-02-08	Fuji Photo Film Co Ltd	感光性平版印刷版
EP0565006A2 (de)	1992-04-06	1993-10-13	Fuji Photo Film Co., Ltd.	Verfahren zur Herstellung einer vorsensibilisierten Platte
EP3051349A1 (de)	2003-07-29	2016-08-03	FUJIFILM Corporation	Alkalilösliches polymer und polymerisierbare zusammensetzung dafür
EP1619023A2 (de)	2004-07-20	2006-01-25	Fuji Photo Film Co., Ltd.	Bilderzeugendes Material
EP1637324A2 (de)	2004-08-26	2006-03-22	Fuji Photo Film Co., Ltd.	Farbiges Bilderzeugungsmaterial und lithographischer Druckplattenvorläufer
EP1629975A1 (de)	2004-08-27	2006-03-01	Fuji Photo Film Co., Ltd.	Flachdruckplattenvorläufer sowie Verfahren zur Herstellung einer Flachdruckplatte
EP1669195A1 (de)	2004-12-13	2006-06-14	Fuji Photo Film Co., Ltd.	Flachdruckverfahren
EP1701213A2 (de)	2005-03-08	2006-09-13	Fuji Photo Film Co., Ltd.	Lichtempfindliche Zusammensetzung
EP1705002A1 (de)	2005-03-23	2006-09-27	Fuji Photo Film Co., Ltd.	Flachdruckplattenvorläufer und Verfahren zur Herstellung der Druckplatte
EP1708025A1 (de)	2005-03-25	2006-10-04	Fuji Photo Film Co., Ltd.	Lichtempfindliche Lithografiedruckform
EP1710627A1 (de)	2005-03-28	2006-10-11	Fuji Photo Film Co., Ltd.	Lichtempfindliche Lithografiedruckform
EP1707353A2 (de)	2005-03-29	2006-10-04	Fuji Photo Film Co., Ltd.	Flachdruckplattenvorläufer mit Bildaufzeichnungsschicht mit Infrarotstrahlenabsorbens, Polymerisationsinitiator, polymerisierbarer Verbindung und Thiolverbindung
EP1757984A1 (de)	2005-08-22	2007-02-28	Fuji Photo Film Co., Ltd.	Lichtempfindliche Lithografiedruckform
JP2008050409A (ja) *	2006-08-22	2008-03-06	Nicca Chemical Co Ltd	アルミニウム材用表面防汚剤、アルミニウム材の防汚処理方法及びアルミニウム材構造物
EP1930770A2 (de)	2006-12-07	2008-06-11	FUJIFILM Corporation	Bildgebungsaufzeichnungsmaterial und neue Verbindung
EP1972438A1 (de)	2007-03-20	2008-09-24	FUJIFILM Corporation	Lithographiedruckplattenvorläufer und Verfahren zur Vorbereitung einer Lithographiedruckplatte
EP1975707A1 (de)	2007-03-27	2008-10-01	Fujifilm Corporation	Härtbare Zusammensetzung und Flachdruckplattenvorläufer
EP2042340A2 (de)	2007-09-27	2009-04-01	Fujifilm Corporation	Mittel zum Schutz der Oberfläche einer lithografischen Druckplatte und Plattenherstellungsverfahren für Lithografiedruckplatten
EP2042532A2 (de)	2007-09-28	2009-04-01	FUJIFILM Corporation	Polymerisierbare Zusammensetzung und Flachdruckplattenvorläufer damit, alkalilösliches Polyurethanharz sowie Verfahren zur Herstellung einer Diolverbindung
EP2042306A2 (de)	2007-09-28	2009-04-01	FUJIFILM Corporation	Planografischer Druckplatten-Vorläufer und Verfahren zur Herstellung eines Copolymers, das darin verwendet wird
EP2042309A2 (de)	2007-09-28	2009-04-01	FUJIFILM Corporation	Verfahren zur Herstellung einer Negativflachdruckplatte
EP2204698A1 (de)	2009-01-06	2010-07-07	FUJIFILM Corporation	Plattenoberflächenbehandlungsmittel für eine lithografische Druckplatte und Verfahren zur Behandlung der lithografischen Druckplatte
WO2013039235A1 (ja)	2011-09-15	2013-03-21	富士フイルム株式会社	製版処理廃液のリサイクル方法
WO2013065853A1 (ja)	2011-11-04	2013-05-10	富士フイルム株式会社	製版処理廃液のリサイクル方法

Also Published As

Publication number	Publication date
JPH0532238B2 (de)	1993-05-14

Legal Events

Date	Code	Title	Description
2004-05-04	EXPY	Cancellation because of completion of term

Publication	Publication Date	Title
JPH0694234B2 (ja)	1994-11-24	感光性平版印刷版
JPH0532238B2 (de)	1993-05-14
JPS5959897A (ja)	1984-04-05	シ−ト、箔又はストリツプの形の材料の製造法及びオフセツト印刷板用支持体
US4801527A (en)	1989-01-31	Presensitized O-quinone diazide plate having an anodized aluminum base with an amine compound containing hydrophilic layer
JPH0448640B2 (de)	1992-08-07
JPS6219494A (ja)	1987-01-28	平版印刷版用支持体
JPH01150583A (ja)	1989-06-13	平版印刷版用支持体
JPS63165183A (ja)	1988-07-08	平版印刷版用支持体
JPH0513078B2 (de)	1993-02-19
JPS6356498A (ja)	1988-03-11	平版印刷版用支持体
JPS63202497A (ja)	1988-08-22	感光性平版印刷版用支持体の製造方法
JPS63145092A (ja)	1988-06-17	平版印刷版用支持体
JPS63130391A (ja)	1988-06-02	平版印刷版用支持体
JPH0472719B2 (de)	1992-11-18
JPS6297892A (ja)	1987-05-07	平版印刷版用支持体
JPS6362795A (ja)	1988-03-19	平版印刷版用支持体の製造方法
JPS59214651A (ja)	1984-12-04	感光性平版印刷版を用いた製版方法
JPH03215095A (ja)	1991-09-20	感光性平版印刷版
JPS63107591A (ja)	1988-05-12	平版印刷版用支持体の製造方法
JPH0225399A (ja)	1990-01-26	平版印刷版用支持体の製造方法
JPS62263092A (ja)	1987-11-16	平版印刷版用支持体
JPS59174393A (ja)	1984-10-02	平版印刷版の製造方法
JPS6330296A (ja)	1988-02-08	感光性平版印刷版用支持体の製造方法
JP2983512B2 (ja)	1999-11-29	感光性平版印刷版及び平版印刷版用アルミニウム支持体
JP2000015948A (ja)	2000-01-18	平版印刷版用アルミニウム支持体及び感光性平版印刷版の製造方法

JPS60232998A - 平版印刷版用支持体 - Google Patents

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Cited By (27)

Cited By (27)

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