JPS6078443A - 光不溶性樹脂組成物 - Google Patents

光不溶性樹脂組成物

Info

Publication number
JPS6078443A
JPS6078443A JP18639883A JP18639883A JPS6078443A JP S6078443 A JPS6078443 A JP S6078443A JP 18639883 A JP18639883 A JP 18639883A JP 18639883 A JP18639883 A JP 18639883A JP S6078443 A JPS6078443 A JP S6078443A
Authority
JP
Japan
Prior art keywords
resin composition
photo
unsatd
ketone
insoluble resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18639883A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0565869B2 (da
Inventor
Kunihiro Ichimura
市村　国宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP18639883A priority Critical patent/JPS6078443A/ja
Publication of JPS6078443A publication Critical patent/JPS6078443A/ja
Publication of JPH0565869B2 publication Critical patent/JPH0565869B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP18639883A 1983-10-05 1983-10-05 光不溶性樹脂組成物 Granted JPS6078443A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18639883A JPS6078443A (ja) 1983-10-05 1983-10-05 光不溶性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18639883A JPS6078443A (ja) 1983-10-05 1983-10-05 光不溶性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6078443A true JPS6078443A (ja) 1985-05-04
JPH0565869B2 JPH0565869B2 (da) 1993-09-20

Family

ID=16187698

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18639883A Granted JPS6078443A (ja) 1983-10-05 1983-10-05 光不溶性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6078443A (da)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992013008A1 (fr) * 1991-01-22 1992-08-06 Nippon Paint Co., Ltd. Composition photopolymerisable
JP2000109509A (ja) * 1998-10-02 2000-04-18 Toppan Printing Co Ltd 可視光重合性組成物

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51100716A (da) * 1975-01-27 1976-09-06 Ici Ltd
JPS5322597A (en) * 1976-07-09 1978-03-02 Gen Electric Hardenable composite
JPS5365381A (en) * 1976-11-22 1978-06-10 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS5550001A (en) * 1978-10-06 1980-04-11 Fuji Photo Film Co Ltd Photo-polymerizable composition
JPS55155018A (en) * 1979-05-21 1980-12-03 Minnesota Mining & Mfg Sensitized iodonium or sulfonium photoinitiator
JPS5710605A (en) * 1980-06-24 1982-01-20 Mitsubishi Chem Ind Ltd Photopolymerizable composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51100716A (da) * 1975-01-27 1976-09-06 Ici Ltd
JPS5322597A (en) * 1976-07-09 1978-03-02 Gen Electric Hardenable composite
JPS5365381A (en) * 1976-11-22 1978-06-10 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS5550001A (en) * 1978-10-06 1980-04-11 Fuji Photo Film Co Ltd Photo-polymerizable composition
JPS55155018A (en) * 1979-05-21 1980-12-03 Minnesota Mining & Mfg Sensitized iodonium or sulfonium photoinitiator
JPS5710605A (en) * 1980-06-24 1982-01-20 Mitsubishi Chem Ind Ltd Photopolymerizable composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992013008A1 (fr) * 1991-01-22 1992-08-06 Nippon Paint Co., Ltd. Composition photopolymerisable
US5368990A (en) * 1991-01-22 1994-11-29 Nippon Paint Co., Ltd. Photopolymerizable composition
JP2000109509A (ja) * 1998-10-02 2000-04-18 Toppan Printing Co Ltd 可視光重合性組成物

Also Published As

Publication number Publication date
JPH0565869B2 (da) 1993-09-20

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