JPS6137775B2 - - Google Patents
Info
- Publication number
- JPS6137775B2 JPS6137775B2 JP16171380A JP16171380A JPS6137775B2 JP S6137775 B2 JPS6137775 B2 JP S6137775B2 JP 16171380 A JP16171380 A JP 16171380A JP 16171380 A JP16171380 A JP 16171380A JP S6137775 B2 JPS6137775 B2 JP S6137775B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- protective resin
- film
- resin film
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16171380A JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16171380A JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5785230A JPS5785230A (en) | 1982-05-27 |
| JPS6137775B2 true JPS6137775B2 (id) | 1986-08-26 |
Family
ID=15740456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16171380A Granted JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5785230A (id) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06100825B2 (ja) * | 1985-08-29 | 1994-12-12 | 富士通株式会社 | パタ−ン形成方法 |
| JP7602924B2 (ja) * | 2021-02-02 | 2024-12-19 | 東京エレクトロン株式会社 | 基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体 |
-
1980
- 1980-11-17 JP JP16171380A patent/JPS5785230A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5785230A (en) | 1982-05-27 |
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