JPS6142831U - 半導体製造装置 - Google Patents

半導体製造装置

Info

Publication number
JPS6142831U
JPS6142831U JP12642284U JP12642284U JPS6142831U JP S6142831 U JPS6142831 U JP S6142831U JP 12642284 U JP12642284 U JP 12642284U JP 12642284 U JP12642284 U JP 12642284U JP S6142831 U JPS6142831 U JP S6142831U
Authority
JP
Japan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
processing gas
gas supply
abstract
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12642284U
Other languages
English (en)
Inventor
敦 小浜
秀治 山本
勝安 西田
芳文 小川
仁昭 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12642284U priority Critical patent/JPS6142831U/ja
Publication of JPS6142831U publication Critical patent/JPS6142831U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Pipeline Systems (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【図面の簡単な説明】 図面は、本考案による半導体製造装置の一実施例を示す
系統図である。 １０・・・処理ガス供給系、２０・・・処理室、３０・
・・排気系、７０・・・残留処理ガス排出系。

Claims (1)

    【実用新案登録請求の範囲】
  1. 処理ガス供給系と排気系とが処理室に連結された半導体
    製造装置において、前記処理ガス供給系に残留処理ガス
    排出系を連結したことを特徴とする半導体製造装置。
JP12642284U 1984-08-22 1984-08-22 半導体製造装置 Pending JPS6142831U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12642284U JPS6142831U (ja) 1984-08-22 1984-08-22 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12642284U JPS6142831U (ja) 1984-08-22 1984-08-22 半導体製造装置

Publications (1)

Publication Number Publication Date
JPS6142831U true JPS6142831U (ja) 1986-03-19

Family

ID=30685097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12642284U Pending JPS6142831U (ja) 1984-08-22 1984-08-22 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS6142831U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0280900A (ja) * 1988-09-14 1990-03-20 Koujiyundo Kagaku Kenkyusho:Kk 立体複合クリーンバルブ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827637A (ja) * 1981-08-11 1983-02-18 Toshiba Corp 気相成長炉におけるガス供給回路

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827637A (ja) * 1981-08-11 1983-02-18 Toshiba Corp 気相成長炉におけるガス供給回路

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0280900A (ja) * 1988-09-14 1990-03-20 Koujiyundo Kagaku Kenkyusho:Kk 立体複合クリーンバルブ

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