JPS6230322A - フオトレジストパタ−ンの形成方法 - Google Patents

フオトレジストパタ−ンの形成方法

Info

Publication number
JPS6230322A
JPS6230322A JP60169510A JP16951085A JPS6230322A JP S6230322 A JPS6230322 A JP S6230322A JP 60169510 A JP60169510 A JP 60169510A JP 16951085 A JP16951085 A JP 16951085A JP S6230322 A JPS6230322 A JP S6230322A
Authority
JP
Japan
Prior art keywords
developer
film
pattern
negative
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60169510A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0569215B2 (2
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Toshio Ito
伊東　敏雄
Takateru Asano
浅野　孝輝
Kenji Kobayashi
健二 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Original Assignee
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Oki Electric Industry Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP60169510A priority Critical patent/JPS6230322A/ja
Priority to EP86105373A priority patent/EP0199303B1/en
Priority to DE8686105373T priority patent/DE3685766T2/de
Publication of JPS6230322A publication Critical patent/JPS6230322A/ja
Priority to US07/129,936 priority patent/US4801518A/en
Publication of JPH0569215B2 publication Critical patent/JPH0569215B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60169510A 1985-04-18 1985-07-31 フオトレジストパタ−ンの形成方法 Granted JPS6230322A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP60169510A JPS6230322A (ja) 1985-07-31 1985-07-31 フオトレジストパタ−ンの形成方法
EP86105373A EP0199303B1 (en) 1985-04-18 1986-04-18 Method of forming a photoresist pattern
DE8686105373T DE3685766T2 (de) 1985-04-18 1986-04-18 Photolackbildherstellungsverfahren.
US07/129,936 US4801518A (en) 1985-04-18 1987-12-03 Method of forming a photoresist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60169510A JPS6230322A (ja) 1985-07-31 1985-07-31 フオトレジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS6230322A true JPS6230322A (ja) 1987-02-09
JPH0569215B2 JPH0569215B2 (2) 1993-09-30

Family

ID=15887847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60169510A Granted JPS6230322A (ja) 1985-04-18 1985-07-31 フオトレジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS6230322A (2)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158451A (ja) * 1987-09-25 1989-06-21 Toray Ind Inc 水なし平版印刷板の製版方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59181535A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd ネガレジストのパタ−ン形成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59181535A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd ネガレジストのパタ−ン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158451A (ja) * 1987-09-25 1989-06-21 Toray Ind Inc 水なし平版印刷板の製版方法

Also Published As

Publication number Publication date
JPH0569215B2 (2) 1993-09-30

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