JPS6251243A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6251243A
JPS6251243A JP60191406A JP19140685A JPS6251243A JP S6251243 A JPS6251243 A JP S6251243A JP 60191406 A JP60191406 A JP 60191406A JP 19140685 A JP19140685 A JP 19140685A JP S6251243 A JPS6251243 A JP S6251243A
Authority
JP
Japan
Prior art keywords
interlayer insulating
insulating film
film
temperature range
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60191406A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0244143B2 (da
Inventor
Masaki Hotta
堀田　正樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60191406A priority Critical patent/JPS6251243A/ja
Publication of JPS6251243A publication Critical patent/JPS6251243A/ja
Publication of JPH0244143B2 publication Critical patent/JPH0244143B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP60191406A 1985-08-30 1985-08-30 半導体装置の製造方法 Granted JPS6251243A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60191406A JPS6251243A (ja) 1985-08-30 1985-08-30 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60191406A JPS6251243A (ja) 1985-08-30 1985-08-30 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6251243A true JPS6251243A (ja) 1987-03-05
JPH0244143B2 JPH0244143B2 (da) 1990-10-02

Family

ID=16274071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60191406A Granted JPS6251243A (ja) 1985-08-30 1985-08-30 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6251243A (da)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02106968A (ja) * 1988-10-17 1990-04-19 Hitachi Ltd 半導体集積回路装置及びその形成方法
US6013338A (en) * 1986-09-09 2000-01-11 Semiconductor Energy Laboratory Co., Ltd. CVD apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6013338A (en) * 1986-09-09 2000-01-11 Semiconductor Energy Laboratory Co., Ltd. CVD apparatus
JPH02106968A (ja) * 1988-10-17 1990-04-19 Hitachi Ltd 半導体集積回路装置及びその形成方法

Also Published As

Publication number Publication date
JPH0244143B2 (da) 1990-10-02

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term