JPS6255654A - 半導体装置用マスク - Google Patents

半導体装置用マスク

Info

Publication number
JPS6255654A
JPS6255654A JP60196412A JP19641285A JPS6255654A JP S6255654 A JPS6255654 A JP S6255654A JP 60196412 A JP60196412 A JP 60196412A JP 19641285 A JP19641285 A JP 19641285A JP S6255654 A JPS6255654 A JP S6255654A
Authority
JP
Japan
Prior art keywords
film
mask
glass mask
thin film
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60196412A
Other languages
English (en)
Japanese (ja)
Other versions
JPH036493B2 (de
Inventor
Yoshihiro Osada
長田　芳裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60196412A priority Critical patent/JPS6255654A/ja
Publication of JPS6255654A publication Critical patent/JPS6255654A/ja
Publication of JPH036493B2 publication Critical patent/JPH036493B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60196412A 1985-09-03 1985-09-03 半導体装置用マスク Granted JPS6255654A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60196412A JPS6255654A (ja) 1985-09-03 1985-09-03 半導体装置用マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60196412A JPS6255654A (ja) 1985-09-03 1985-09-03 半導体装置用マスク

Publications (2)

Publication Number Publication Date
JPS6255654A true JPS6255654A (ja) 1987-03-11
JPH036493B2 JPH036493B2 (de) 1991-01-30

Family

ID=16357425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60196412A Granted JPS6255654A (ja) 1985-09-03 1985-09-03 半導体装置用マスク

Country Status (1)

Country Link
JP (1) JPS6255654A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10466585B2 (en) 2015-12-17 2019-11-05 Asml Netherlands B.V. Pellicle and pellicle assembly

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10466585B2 (en) 2015-12-17 2019-11-05 Asml Netherlands B.V. Pellicle and pellicle assembly
US10983431B2 (en) 2015-12-17 2021-04-20 Asml Netherlands B.V. Pellicle and pellicle assembly
US11347142B2 (en) 2015-12-17 2022-05-31 Asml Netherlands B.V. Pellicle and pellicle assembly
US12066758B2 (en) 2015-12-17 2024-08-20 Asml Netherlands B.V. Pellicle and pellicle assembly

Also Published As

Publication number Publication date
JPH036493B2 (de) 1991-01-30

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