JPS6310893B2 - - Google Patents

Info

Publication number
JPS6310893B2
JPS6310893B2 JP56119194A JP11919481A JPS6310893B2 JP S6310893 B2 JPS6310893 B2 JP S6310893B2 JP 56119194 A JP56119194 A JP 56119194A JP 11919481 A JP11919481 A JP 11919481A JP S6310893 B2 JPS6310893 B2 JP S6310893B2
Authority
JP
Japan
Prior art keywords
gas
silicon nitride
film
nitride film
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56119194A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5826014A (ja
Inventor
Kenji Ikeda
Kazuhisa Takahashi
Jun Oosawa
Wataru Suzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP11919481A priority Critical patent/JPS5826014A/ja
Publication of JPS5826014A publication Critical patent/JPS5826014A/ja
Publication of JPS6310893B2 publication Critical patent/JPS6310893B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
JP11919481A 1981-07-31 1981-07-31 シリコン窒化膜の形成方法 Granted JPS5826014A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11919481A JPS5826014A (ja) 1981-07-31 1981-07-31 シリコン窒化膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11919481A JPS5826014A (ja) 1981-07-31 1981-07-31 シリコン窒化膜の形成方法

Publications (2)

Publication Number Publication Date
JPS5826014A JPS5826014A (ja) 1983-02-16
JPS6310893B2 true JPS6310893B2 (it) 1988-03-10

Family

ID=14755243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11919481A Granted JPS5826014A (ja) 1981-07-31 1981-07-31 シリコン窒化膜の形成方法

Country Status (1)

Country Link
JP (1) JPS5826014A (it)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421171A (en) * 1977-07-18 1979-02-17 Matsushita Electric Ind Co Ltd Manufacture for compound semiconductor device
JPS5664442A (en) * 1979-10-30 1981-06-01 Mitsubishi Electric Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS5826014A (ja) 1983-02-16

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