JPS6322298B2 - - Google Patents

Info

Publication number
JPS6322298B2
JPS6322298B2 JP56028721A JP2872181A JPS6322298B2 JP S6322298 B2 JPS6322298 B2 JP S6322298B2 JP 56028721 A JP56028721 A JP 56028721A JP 2872181 A JP2872181 A JP 2872181A JP S6322298 B2 JPS6322298 B2 JP S6322298B2
Authority
JP
Japan
Prior art keywords
thin film
photomask
etching
electron beam
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56028721A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57144549A (en
Inventor
Chihiro Tabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2872181A priority Critical patent/JPS57144549A/ja
Priority to EP81107702A priority patent/EP0049799B1/de
Priority to DE8181107702T priority patent/DE3173769D1/de
Priority to US06/318,201 priority patent/US4440841A/en
Publication of JPS57144549A publication Critical patent/JPS57144549A/ja
Publication of JPS6322298B2 publication Critical patent/JPS6322298B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2872181A 1980-10-09 1981-02-28 Photomask Granted JPS57144549A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2872181A JPS57144549A (en) 1981-02-28 1981-02-28 Photomask
EP81107702A EP0049799B1 (de) 1980-10-09 1981-09-28 Blankophotoschablone und Photoschablone
DE8181107702T DE3173769D1 (en) 1980-10-09 1981-09-28 Photomask blank and photomask
US06/318,201 US4440841A (en) 1981-02-28 1981-11-04 Photomask and photomask blank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2872181A JPS57144549A (en) 1981-02-28 1981-02-28 Photomask

Publications (2)

Publication Number Publication Date
JPS57144549A JPS57144549A (en) 1982-09-07
JPS6322298B2 true JPS6322298B2 (de) 1988-05-11

Family

ID=12256296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2872181A Granted JPS57144549A (en) 1980-10-09 1981-02-28 Photomask

Country Status (1)

Country Link
JP (1) JPS57144549A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57182740A (en) * 1981-05-07 1982-11-10 Dainippon Printing Co Ltd Photomask

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5352073A (en) * 1976-10-22 1978-05-12 Hoya Denshi Kk Photomask for ic
JPS6025024B2 (ja) * 1977-09-20 1985-06-15 三菱電機株式会社 フオトマスク用原板
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material

Also Published As

Publication number Publication date
JPS57144549A (en) 1982-09-07

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