JPS57144549A - Photomask - Google Patents

Photomask

Info

Publication number: JPS57144549A
Authority: JP; Japan
Prior art keywords: thin film; static electricity; transparent; light shielding; successively
Prior art date: 1981-02-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP2872181A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6322298B2 (de

Inventor

Chihiro Tabuchi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Dai Nippon Printing Co Ltd

Original Assignee

Dai Nippon Printing Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-02-28

Filing date

1981-02-28

Publication date

1982-09-07

1981-02-28 Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd

1981-02-28 Priority to JP2872181A priority Critical patent/JPS57144549A/ja

1981-09-28 Priority to EP81107702A priority patent/EP0049799B1/de

1981-09-28 Priority to DE8181107702T priority patent/DE3173769D1/de

1981-11-04 Priority to US06/318,201 priority patent/US4440841A/en

1982-09-07 Publication of JPS57144549A publication Critical patent/JPS57144549A/ja

1988-05-11 Publication of JPS6322298B2 publication Critical patent/JPS6322298B2/ja

Status Granted legal-status Critical Current

Links

239000010409 thin film Substances 0.000 abstract 6
230000005611 electricity Effects 0.000 abstract 3
230000003068 static effect Effects 0.000 abstract 3
ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 abstract 2
CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 abstract 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
229910052804 chromium Inorganic materials 0.000 abstract 2
230000007547 defect Effects 0.000 abstract 2
QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 abstract 2
229910052710 silicon Inorganic materials 0.000 abstract 2
239000000126 substance Substances 0.000 abstract 2
239000000758 substrate Substances 0.000 abstract 2
229910052715 tantalum Inorganic materials 0.000 abstract 2
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 abstract 1
229910000422 cerium(IV) oxide Inorganic materials 0.000 abstract 1
229910052681 coesite Inorganic materials 0.000 abstract 1
229910052593 corundum Inorganic materials 0.000 abstract 1
229910052906 cristobalite Inorganic materials 0.000 abstract 1
238000007599 discharging Methods 0.000 abstract 1
239000000428 dust Substances 0.000 abstract 1
239000010408 film Substances 0.000 abstract 1
239000011521 glass Substances 0.000 abstract 1
229910052737 gold Inorganic materials 0.000 abstract 1
JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract 1
238000010030 laminating Methods 0.000 abstract 1
239000007788 liquid Substances 0.000 abstract 1
238000004519 manufacturing process Methods 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
229910052750 molybdenum Inorganic materials 0.000 abstract 1
229910052758 niobium Inorganic materials 0.000 abstract 1
230000001681 protective effect Effects 0.000 abstract 1
239000010703 silicon Substances 0.000 abstract 1
239000000377 silicon dioxide Substances 0.000 abstract 1
235000012239 silicon dioxide Nutrition 0.000 abstract 1
229910052682 stishovite Inorganic materials 0.000 abstract 1
PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract 1
229910052719 titanium Inorganic materials 0.000 abstract 1
229910052905 tridymite Inorganic materials 0.000 abstract 1
229910052721 tungsten Inorganic materials 0.000 abstract 1
229910052720 vanadium Inorganic materials 0.000 abstract 1
238000005406 washing Methods 0.000 abstract 1
229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
229910052726 zirconium Inorganic materials 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)

JP2872181A 1980-10-09 1981-02-28 Photomask Granted JPS57144549A (en)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
JP2872181A JPS57144549A (en)	1981-02-28	1981-02-28	Photomask
EP81107702A EP0049799B1 (de)	1980-10-09	1981-09-28	Blankophotoschablone und Photoschablone
DE8181107702T DE3173769D1 (en)	1980-10-09	1981-09-28	Photomask blank and photomask
US06/318,201 US4440841A (en)	1981-02-28	1981-11-04	Photomask and photomask blank

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2872181A JPS57144549A (en)	1981-02-28	1981-02-28	Photomask

Publications (2)

Publication Number	Publication Date
JPS57144549A true JPS57144549A (en)	1982-09-07
JPS6322298B2 JPS6322298B2 (de)	1988-05-11

Family

ID=12256296

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2872181A Granted JPS57144549A (en)	1980-10-09	1981-02-28	Photomask

Country Status (1)

Country	Link
JP (1)	JPS57144549A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS57182740A (en) *	1981-05-07	1982-11-10	Dainippon Printing Co Ltd	Photomask

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5352073A (en) *	1976-10-22	1978-05-12	Hoya Denshi Kk	Photomask for ic
JPS5446479A (en) *	1977-09-20	1979-04-12	Mitsubishi Electric Corp	Negative plate for photo mask
JPS5451831A (en) *	1977-09-30	1979-04-24	Konishiroku Photo Ind Co Ltd	Photomask material

1981
- 1981-02-28 JP JP2872181A patent/JPS57144549A/ja active Granted

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5352073A (en) *	1976-10-22	1978-05-12	Hoya Denshi Kk	Photomask for ic
JPS5446479A (en) *	1977-09-20	1979-04-12	Mitsubishi Electric Corp	Negative plate for photo mask
JPS5451831A (en) *	1977-09-30	1979-04-24	Konishiroku Photo Ind Co Ltd	Photomask material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS57182740A (en) *	1981-05-07	1982-11-10	Dainippon Printing Co Ltd	Photomask

Also Published As

Publication number	Publication date
JPS6322298B2 (de)	1988-05-11

Publication	Publication Date	Title
US4440841A (en)	1984-04-03	Photomask and photomask blank
JPS57144549A (en)	1982-09-07	Photomask
JPS5451831A (en)	1979-04-24	Photomask material
US3824100A (en)	1974-07-16	Transparent iron oxide microcircuit mask
JPS57144550A (en)	1982-09-07	Blank plate for photomask
JPS57182741A (en)	1982-11-10	Photomask blank plate
JPS5532088A (en)	1980-03-06	Photo mask forming method
SE334424B (de)	1971-04-26
EP0049799A2 (de)	1982-04-21	Blankophotoschablone und Photoschablone
JPS57182740A (en)	1982-11-10	Photomask
JPH04318955A (ja)	1992-11-10	ダミーウェハー用ガラス基板
JPS61240243A (ja)	1986-10-25	フオトマスクブランクおよびフオトマスク
JPS55115042A (en)	1980-09-04	Glass mask protection method
JPS63121054A (ja)	1988-05-25	フオトマスク
JPS57147634A (en)	1982-09-11	Photomask blank
JPS622259A (ja)	1987-01-08	フオトマスクブランクとフオトマスク
JPS61270761A (ja)	1986-12-01	パタ−ン形成用マスク
JPS6311728Y2 (de)	1988-04-05
JPH0493948A (ja)	1992-03-26	フォトマスク
US1724875A (en)	1929-08-13	Method of making reproducing plates
JPS61198156A (ja)	1986-09-02	改良されたフオトマスクブランク
JPS57135950A (en)	1982-08-21	Preparation of photomask
JPS61149950A (ja)	1986-07-08	半導体素子用フオトマスク
JPS5643641A (en)	1981-04-22	Photomask
JPH01154156A (ja)	1989-06-16	遮光性膜被着基板及び遮光パターン付き基板

JPS57144549A - Photomask - Google Patents

Info

Links

Classifications

Landscapes

Priority Applications (4)

Applications Claiming Priority (1)

Publications (2)

Family

ID=12256296

Family Applications (1)

Country Status (1)

Cited By (1)

Citations (3)

Patent Citations (3)

Cited By (1)

Also Published As

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