JPS6323161A - 感光性樹脂版用連続洗い出し装置 - Google Patents

感光性樹脂版用連続洗い出し装置

Info

Publication number
JPS6323161A
JPS6323161A JP9318887A JP9318887A JPS6323161A JP S6323161 A JPS6323161 A JP S6323161A JP 9318887 A JP9318887 A JP 9318887A JP 9318887 A JP9318887 A JP 9318887A JP S6323161 A JPS6323161 A JP S6323161A
Authority
JP
Japan
Prior art keywords
plate
washing
photosensitive resin
speed
belt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9318887A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6348049B2 (2
Inventor
Etsuro Uehara
上原　悦郎
Naoyuki Mitani
三谷　直之
Tadahiko Furukawa
古川　忠彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP9318887A priority Critical patent/JPS6323161A/ja
Publication of JPS6323161A publication Critical patent/JPS6323161A/ja
Publication of JPS6348049B2 publication Critical patent/JPS6348049B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9318887A 1987-04-17 1987-04-17 感光性樹脂版用連続洗い出し装置 Granted JPS6323161A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9318887A JPS6323161A (ja) 1987-04-17 1987-04-17 感光性樹脂版用連続洗い出し装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9318887A JPS6323161A (ja) 1987-04-17 1987-04-17 感光性樹脂版用連続洗い出し装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11599478A Division JPS5543526A (en) 1978-09-22 1978-09-22 Continuous washing-out device for photosensitive resin plate

Publications (2)

Publication Number Publication Date
JPS6323161A true JPS6323161A (ja) 1988-01-30
JPS6348049B2 JPS6348049B2 (2) 1988-09-27

Family

ID=14075602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9318887A Granted JPS6323161A (ja) 1987-04-17 1987-04-17 感光性樹脂版用連続洗い出し装置

Country Status (1)

Country Link
JP (1) JPS6323161A (2)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997033197A1 (fr) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Procede de preparation d'une planche d'impression photosensible, solution de developpement aqueuse associee, solution de rinçage aqueuse et revelateur destine a la planche d'impression photosensible
JP2005345502A (ja) * 2004-05-31 2005-12-15 Asahi Kasei Chemicals Corp 印刷版製造装置
JP2020128044A (ja) * 2019-02-08 2020-08-27 みさとみらい２１株式会社 樹脂凸版印刷版およびその製造方法ならびに印刷装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997033197A1 (fr) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Procede de preparation d'une planche d'impression photosensible, solution de developpement aqueuse associee, solution de rinçage aqueuse et revelateur destine a la planche d'impression photosensible
JP2005345502A (ja) * 2004-05-31 2005-12-15 Asahi Kasei Chemicals Corp 印刷版製造装置
JP2020128044A (ja) * 2019-02-08 2020-08-27 みさとみらい２１株式会社 樹脂凸版印刷版およびその製造方法ならびに印刷装置

Also Published As

Publication number Publication date
JPS6348049B2 (2) 1988-09-27

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