JPS63252428A - Ｘ線マスクの形成方法 - Google Patents

Ｘ線マスクの形成方法

Info

Publication number
JPS63252428A
JPS63252428A JP61265788A JP26578886A JPS63252428A JP S63252428 A JPS63252428 A JP S63252428A JP 61265788 A JP61265788 A JP 61265788A JP 26578886 A JP26578886 A JP 26578886A JP S63252428 A JPS63252428 A JP S63252428A
Authority
JP
Japan
Prior art keywords
ray
rays
film
heavy metal
absorber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61265788A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0519975B2 (fr
Inventor
Masahiko Urai
浦井　正彦
Katsuji Iguchi
勝次 井口
Chiyako Shiga
志賀　千也子
Masayoshi Koba
木場　正義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP61265788A priority Critical patent/JPS63252428A/ja
Publication of JPS63252428A publication Critical patent/JPS63252428A/ja
Publication of JPH0519975B2 publication Critical patent/JPH0519975B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61265788A 1986-11-07 1986-11-07 Ｘ線マスクの形成方法 Granted JPS63252428A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61265788A JPS63252428A (ja) 1986-11-07 1986-11-07 Ｘ線マスクの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61265788A JPS63252428A (ja) 1986-11-07 1986-11-07 Ｘ線マスクの形成方法

Publications (2)

Publication Number Publication Date
JPS63252428A true JPS63252428A (ja) 1988-10-19
JPH0519975B2 JPH0519975B2 (fr) 1993-03-18

Family

ID=17422052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61265788A Granted JPS63252428A (ja) 1986-11-07 1986-11-07 Ｘ線マスクの形成方法

Country Status (1)

Country Link
JP (1) JPS63252428A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0298717A (ja) * 1988-10-05 1990-04-11 I M V Kk 振動制御装置
US5464711A (en) * 1994-08-01 1995-11-07 Motorola Inc. Process for fabricating an X-ray absorbing mask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172725U (fr) * 1986-04-21 1987-11-02

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172725U (fr) * 1986-04-21 1987-11-02

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0298717A (ja) * 1988-10-05 1990-04-11 I M V Kk 振動制御装置
US5464711A (en) * 1994-08-01 1995-11-07 Motorola Inc. Process for fabricating an X-ray absorbing mask

Also Published As

Publication number Publication date
JPH0519975B2 (fr) 1993-03-18

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