JPS6364856B2 - - Google Patents

Info

Publication number
JPS6364856B2
JPS6364856B2 JP57022736A JP2273682A JPS6364856B2 JP S6364856 B2 JPS6364856 B2 JP S6364856B2 JP 57022736 A JP57022736 A JP 57022736A JP 2273682 A JP2273682 A JP 2273682A JP S6364856 B2 JPS6364856 B2 JP S6364856B2
Authority
JP
Japan
Prior art keywords
wafer
vacuum chamber
supply port
links
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57022736A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58140961A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57022736A priority Critical patent/JPS58140961A/ja
Publication of JPS58140961A publication Critical patent/JPS58140961A/ja
Publication of JPS6364856B2 publication Critical patent/JPS6364856B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP57022736A 1982-02-17 1982-02-17 ウエ−ハ搬送装置 Granted JPS58140961A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57022736A JPS58140961A (ja) 1982-02-17 1982-02-17 ウエ−ハ搬送装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57022736A JPS58140961A (ja) 1982-02-17 1982-02-17 ウエ−ハ搬送装置

Publications (2)

Publication Number Publication Date
JPS58140961A JPS58140961A (ja) 1983-08-20
JPS6364856B2 true JPS6364856B2 (da) 1988-12-13

Family

ID=12091010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57022736A Granted JPS58140961A (ja) 1982-02-17 1982-02-17 ウエ−ハ搬送装置

Country Status (1)

Country Link
JP (1) JPS58140961A (da)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006032930A (ja) * 2004-06-14 2006-02-02 Semiconductor Energy Lab Co Ltd ドーピング装置
JP4907077B2 (ja) * 2004-11-30 2012-03-28 株式会社Ｓｅｎ ウエハ処理装置及びウエハ処理方法並びにイオン注入装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5321420Y2 (da) * 1974-02-18 1978-06-05
US3951695A (en) * 1975-02-11 1976-04-20 Accelerators, Inc. Automatic end station for ion implantation system
JPS52149981A (en) * 1976-06-09 1977-12-13 Hitachi Ltd Wafer scanning device
JPS5351976A (en) * 1976-10-22 1978-05-11 Hitachi Ltd Wafer feeder
JPS54159963U (da) * 1978-04-28 1979-11-08

Also Published As

Publication number Publication date
JPS58140961A (ja) 1983-08-20

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