JPS58140961A - ウエ−ハ搬送装置 - Google Patents

ウエ−ハ搬送装置

Info

Publication number
JPS58140961A
JPS58140961A JP57022736A JP2273682A JPS58140961A JP S58140961 A JPS58140961 A JP S58140961A JP 57022736 A JP57022736 A JP 57022736A JP 2273682 A JP2273682 A JP 2273682A JP S58140961 A JPS58140961 A JP S58140961A
Authority
JP
Japan
Prior art keywords
wafer
guide plate
endless
vacuum chamber
links
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57022736A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6364856B2 (da
Inventor
Norio Kanai
金井　謙雄
Mitsunori Ketsusako
光紀 蕨迫
Katsumi Tokikuchi
登木口　克巳
Toru Habu
徹 土生
Tadashi Saito
忠 斎藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57022736A priority Critical patent/JPS58140961A/ja
Publication of JPS58140961A publication Critical patent/JPS58140961A/ja
Publication of JPS6364856B2 publication Critical patent/JPS6364856B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP57022736A 1982-02-17 1982-02-17 ウエ−ハ搬送装置 Granted JPS58140961A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57022736A JPS58140961A (ja) 1982-02-17 1982-02-17 ウエ−ハ搬送装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57022736A JPS58140961A (ja) 1982-02-17 1982-02-17 ウエ−ハ搬送装置

Publications (2)

Publication Number Publication Date
JPS58140961A true JPS58140961A (ja) 1983-08-20
JPS6364856B2 JPS6364856B2 (da) 1988-12-13

Family

ID=12091010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57022736A Granted JPS58140961A (ja) 1982-02-17 1982-02-17 ウエ−ハ搬送装置

Country Status (1)

Country Link
JP (1) JPS58140961A (da)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006032930A (ja) * 2004-06-14 2006-02-02 Semiconductor Energy Lab Co Ltd ドーピング装置
JP2006156762A (ja) * 2004-11-30 2006-06-15 Sumitomo Eaton Noba Kk ウエハ処理装置及びウエハ処理方法並びにイオン注入装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50109596U (da) * 1974-02-18 1975-09-08
JPS5194773A (da) * 1975-02-11 1976-08-19
JPS52149981A (en) * 1976-06-09 1977-12-13 Hitachi Ltd Wafer scanning device
JPS5351976A (en) * 1976-10-22 1978-05-11 Hitachi Ltd Wafer feeder
JPS54159963U (da) * 1978-04-28 1979-11-08

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50109596U (da) * 1974-02-18 1975-09-08
JPS5194773A (da) * 1975-02-11 1976-08-19
JPS52149981A (en) * 1976-06-09 1977-12-13 Hitachi Ltd Wafer scanning device
JPS5351976A (en) * 1976-10-22 1978-05-11 Hitachi Ltd Wafer feeder
JPS54159963U (da) * 1978-04-28 1979-11-08

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006032930A (ja) * 2004-06-14 2006-02-02 Semiconductor Energy Lab Co Ltd ドーピング装置
JP2006156762A (ja) * 2004-11-30 2006-06-15 Sumitomo Eaton Noba Kk ウエハ処理装置及びウエハ処理方法並びにイオン注入装置

Also Published As

Publication number Publication date
JPS6364856B2 (da) 1988-12-13

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