JPS636725U - - Google Patents
Info
- Publication number
- JPS636725U JPS636725U JP10126586U JP10126586U JPS636725U JP S636725 U JPS636725 U JP S636725U JP 10126586 U JP10126586 U JP 10126586U JP 10126586 U JP10126586 U JP 10126586U JP S636725 U JPS636725 U JP S636725U
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- frequency oscillation
- phase growth
- oscillation coil
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010355 oscillation Effects 0.000 claims description 4
- 238000001947 vapour-phase growth Methods 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 claims 1
Landscapes
- General Induction Heating (AREA)
Description
図は本考案の一実施例を示す概要断面図である
。
８……反応室、１２……サセプタ、１３……コ
イルカバー、１４……高周波発振コイル、２０…
…ノズル、２１……排気口、２２……ウエハ。
The figure is a schematic sectional view showing an embodiment of the present invention. 8...Reaction chamber, 12...Susceptor, 13...Coil cover, 14...High frequency oscillation coil, 20...
...Nozzle, 21...Exhaust port, 22...Wafer.
Claims (1)
方式の気相成長装置において、前記高周波発振コ
イルにサセプタからの輻射線を反射させるための
表面処理を施こしたことを特徴とする気相成長装
置。 ２ 高周波発振コイルの表面に金、銀のうちいず
れかの被膜を設けたことを特徴とする実用新案登
録請求の範囲第１項記載の気相成長装置。[Claims for Utility Model Registration] 1. A vapor phase growth apparatus in which a susceptor is heated by a high-frequency oscillation coil, characterized in that the high-frequency oscillation coil is subjected to a surface treatment to reflect radiation from the susceptor. vapor phase growth equipment. 2. The vapor phase growth apparatus according to claim 1 of the utility model registration, characterized in that a coating of either gold or silver is provided on the surface of the high frequency oscillation coil.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10126586U JPS636725U (en) | 1986-07-01 | 1986-07-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10126586U JPS636725U (en) | 1986-07-01 | 1986-07-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS636725U true JPS636725U (en) | 1988-01-18 |
Family
ID=30971852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10126586U Pending JPS636725U (en) | 1986-07-01 | 1986-07-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS636725U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6136924A (en) * | 1984-07-19 | 1986-02-21 | エルピーイー・ソチエタ・ペル・アチオニ | Epitaxie reactor |
-
1986
- 1986-07-01 JP JP10126586U patent/JPS636725U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6136924A (en) * | 1984-07-19 | 1986-02-21 | エルピーイー・ソチエタ・ペル・アチオニ | Epitaxie reactor |
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