JPS6445767U - - Google Patents
Info
- Publication number
- JPS6445767U JPS6445767U JP14202887U JP14202887U JPS6445767U JP S6445767 U JPS6445767 U JP S6445767U JP 14202887 U JP14202887 U JP 14202887U JP 14202887 U JP14202887 U JP 14202887U JP S6445767 U JPS6445767 U JP S6445767U
- Authority
- JP
- Japan
- Prior art keywords
- coil cover
- coil
- air bearing
- bearing mechanism
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 230000006698 induction Effects 0.000 claims 1
- 238000005192 partition Methods 0.000 claims 1
- 239000012071 phase Substances 0.000 claims 1
- 239000012808 vapor phase Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図ａは本考案の第１の実施例を示す縦断面
図、第１図ｂは第１図ａのＡ部の詳細断面図、第
２図は本考案の第２の実施例を示す縦断面図、第
３図は従来の一般的エピタキシヤル装置を示す縦
断面図、第４図ａ，ｂは従来の外周駆動構造を示
す断面図である。
１……ベルジヤー、２……インナーベルジヤー
、４……反応ガス吹出しノズル、５……Ｓ：Ｃコ
ートグラフアイトサセプター、６……石英コイル
カバー、７……高周波加熱コイル、８……コイル
カバー支持リング、９……エアベアリング、１４
……半導体ウエハー。
Figure 1a is a longitudinal sectional view showing the first embodiment of the present invention, Figure 1b is a detailed sectional view of section A in Figure 1a, and Figure 2 is a second embodiment of the invention. 3 is a longitudinal sectional view showing a conventional general epitaxial device, and FIGS. 4a and 4b are sectional views showing a conventional peripheral drive structure. DESCRIPTION OF SYMBOLS 1... Bell gear, 2... Inner bell gear, 4... Reactive gas blow-off nozzle, 5... S:C coated graphite susceptor, 6... Quartz coil cover, 7... High frequency heating coil, 8... Coil cover Support ring, 9... Air bearing, 14
...Semiconductor wafer.
Claims (1)
を反応エリアと仕切つて覆う石英製コイルカバー
と、Ｓ：Ｃコートグラフアイトサセプターと、ベ
ルジヤーとを有する気相エピタキシヤル装置にお
いて、該コイルカバーにＳ：Ｃコートグラフアイ
トサセプターを載せ、かつコイルカバー下部の外
円周上に連続又は分割したエアベアリング機構を
設け、このエアベアリング機構にてコイルカバー
を回転可能に浮上支持させたことを特徴とする気
相エピタキシヤル装置。 In a vapor phase epitaxial apparatus having a high-frequency induction heating coil, a quartz coil cover that partitions and covers the entire heating coil from a reaction area, an S:C coated graphite susceptor, and a bell gear, the coil cover is coated with S:C. A gas phase characterized in that a coat graphite susceptor is mounted and a continuous or divided air bearing mechanism is provided on the outer circumference of the lower part of the coil cover, and the coil cover is rotatably supported floating by this air bearing mechanism. Epitaxial equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14202887U JPS6445767U (en) | 1987-09-17 | 1987-09-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14202887U JPS6445767U (en) | 1987-09-17 | 1987-09-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6445767U true JPS6445767U (en) | 1989-03-20 |
Family
ID=31407617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14202887U Pending JPS6445767U (en) | 1987-09-17 | 1987-09-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6445767U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001118837A (en) * | 1992-09-07 | 2001-04-27 | Mitsubishi Electric Corp | Semiconductor manufacturing equipment |
| JP2011025022A (en) * | 2009-06-29 | 2011-02-10 | Tana-X:Kk | Merchandise display apparatus and merchandise display plate |
| JP2011224075A (en) * | 2010-04-16 | 2011-11-10 | Rengo Co Ltd | Display panel |
| WO2014087920A1 (en) * | 2012-12-04 | 2014-06-12 | 東京エレクトロン株式会社 | Film formation apparatus |
-
1987
- 1987-09-17 JP JP14202887U patent/JPS6445767U/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001118837A (en) * | 1992-09-07 | 2001-04-27 | Mitsubishi Electric Corp | Semiconductor manufacturing equipment |
| JP2011025022A (en) * | 2009-06-29 | 2011-02-10 | Tana-X:Kk | Merchandise display apparatus and merchandise display plate |
| JP2011224075A (en) * | 2010-04-16 | 2011-11-10 | Rengo Co Ltd | Display panel |
| WO2014087920A1 (en) * | 2012-12-04 | 2014-06-12 | 東京エレクトロン株式会社 | Film formation apparatus |
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