JPS6373360U - - Google Patents

Info

Publication number
JPS6373360U
JPS6373360U JP16840186U JP16840186U JPS6373360U JP S6373360 U JPS6373360 U JP S6373360U JP 16840186 U JP16840186 U JP 16840186U JP 16840186 U JP16840186 U JP 16840186U JP S6373360 U JPS6373360 U JP S6373360U
Authority
JP
Japan
Prior art keywords
vapor deposition
shutter
source
utility
registration request
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16840186U
Other languages
Japanese (ja)
Other versions
JPH0543090Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16840186U priority Critical patent/JPH0543090Y2/ja
Publication of JPS6373360U publication Critical patent/JPS6373360U/ja
Application granted granted Critical
Publication of JPH0543090Y2 publication Critical patent/JPH0543090Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

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  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例における蒸着制御用
シヤツターを用いた真空蒸着装置の概略図、第2
図は従来の蒸着制御用シヤツターを用いた真空蒸
着装置の概略図である。 1,2…蒸発源、3…熱遮蔽板、5…基板、6
…本考案の蒸着制御用シヤツター、7,8…熱反
射面(熱放散手段)。
Figure 1 is a schematic diagram of a vacuum evaporation apparatus using a shutter for evaporation control in one embodiment of the present invention;
The figure is a schematic diagram of a vacuum evaporation apparatus using a conventional shutter for evaporation control. 1, 2... Evaporation source, 3... Heat shielding plate, 5... Substrate, 6
...Shutter for vapor deposition control of the present invention, 7, 8... Heat reflecting surface (heat dissipation means).

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空蒸着装置の蒸発源から放射される輻討熱を
蒸着源以外の方向へ放散させる手段を備えたこと
を特徴とする蒸着制御用シヤツター。
1. A shutter for controlling vapor deposition, comprising means for dissipating radiation heat emitted from an evaporation source of a vacuum vapor deposition apparatus in a direction other than the vapor deposition source.
JP16840186U 1986-10-31 1986-10-31 Expired - Lifetime JPH0543090Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16840186U JPH0543090Y2 (en) 1986-10-31 1986-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16840186U JPH0543090Y2 (en) 1986-10-31 1986-10-31

Publications (2)

Publication Number Publication Date
JPS6373360U true JPS6373360U (en) 1988-05-16
JPH0543090Y2 JPH0543090Y2 (en) 1993-10-29

Family

ID=31101250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16840186U Expired - Lifetime JPH0543090Y2 (en) 1986-10-31 1986-10-31

Country Status (1)

Country Link
JP (1) JPH0543090Y2 (en)

Also Published As

Publication number Publication date
JPH0543090Y2 (en) 1993-10-29

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