JPS6410236A - Pattern forming material - Google Patents

Pattern forming material

Info

Publication number
JPS6410236A
JPS6410236A JP62165762A JP16576287A JPS6410236A JP S6410236 A JPS6410236 A JP S6410236A JP 62165762 A JP62165762 A JP 62165762A JP 16576287 A JP16576287 A JP 16576287A JP S6410236 A JPS6410236 A JP S6410236A
Authority
JP
Japan
Prior art keywords
resin
acridine
derivative
maleimide
pattern forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62165762A
Other languages
English (en)
Inventor
Masataka Endo
Masaru Sasako
Yoshiyuki Tani
Kazufumi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62165762A priority Critical patent/JPS6410236A/ja
Publication of JPS6410236A publication Critical patent/JPS6410236A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP62165762A 1987-07-02 1987-07-02 Pattern forming material Pending JPS6410236A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62165762A JPS6410236A (en) 1987-07-02 1987-07-02 Pattern forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62165762A JPS6410236A (en) 1987-07-02 1987-07-02 Pattern forming material

Publications (1)

Publication Number Publication Date
JPS6410236A true JPS6410236A (en) 1989-01-13

Family

ID=15818561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62165762A Pending JPS6410236A (en) 1987-07-02 1987-07-02 Pattern forming material

Country Status (1)

Country Link
JP (1) JPS6410236A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01284849A (ja) * 1988-05-12 1989-11-16 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH07333038A (ja) * 1994-06-03 1995-12-22 Endress & Hauser Gmbh & Co 容器内の所定の充填状態を検出および／または監視するための装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01284849A (ja) * 1988-05-12 1989-11-16 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH07333038A (ja) * 1994-06-03 1995-12-22 Endress & Hauser Gmbh & Co 容器内の所定の充填状態を検出および／または監視するための装置

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