JPS6423868U - - Google Patents
Info
- Publication number
- JPS6423868U JPS6423868U JP11797887U JP11797887U JPS6423868U JP S6423868 U JPS6423868 U JP S6423868U JP 11797887 U JP11797887 U JP 11797887U JP 11797887 U JP11797887 U JP 11797887U JP S6423868 U JPS6423868 U JP S6423868U
- Authority
- JP
- Japan
- Prior art keywords
- high frequency
- coupled plasma
- plasma torch
- mass spectrometer
- inductively coupled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 4
- 238000009616 inductively coupled plasma Methods 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 3
- 230000006698 induction Effects 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案実施例の構成説明図、第２図は
従来例の構成説明図、第３図及び第４図はスペク
トル図である。
１……プラズマトーチ、３……アルゴンガス供
給源、７……高周波誘導結合プラズマ、８……ノ
ズル、９……スキマー、１１……フオアチヤンバ
ー、１３……センターチヤンバー、１６……マス
フイルタ、１７……リアチヤンバー、２０……信
号処理部、２１……窒素ガス供給源、２２ａ，２
２ｂ……減圧弁、２３ａ，２３ｂ……流量計、２
４ａ，２４ｂ……流量調節弁、２５……流体混合
部。
FIG. 1 is an explanatory diagram of the configuration of an embodiment of the present invention, FIG. 2 is an explanatory diagram of the configuration of a conventional example, and FIGS. 3 and 4 are spectrum diagrams. DESCRIPTION OF SYMBOLS 1...Plasma torch, 3...Argon gas supply source, 7...High frequency inductively coupled plasma, 8...Nozzle, 9...Skimmer, 11...Four chamber, 13...Center chamber, 16...Mass filter, 17 ... Rear chamber, 20 ... Signal processing section, 21 ... Nitrogen gas supply source, 22a, 2
2b...Pressure reducing valve, 23a, 23b...Flow meter, 2
4a, 24b...flow control valve, 25...fluid mixing section.
Claims (1)
起し生じたイオンを真空中に導入しイオン光学系
を通して質量分析計検出器に導いて検出すること
により前記試料中の被測定元素を分析する分析計
において、前記高周波誘導結合プラズマを生じさ
せる三重管構造のプラズマトーチへ、アルゴンガ
ス供給源から第１減圧弁、第１流量計、第１流量
調節弁、及び流体混合部を通つて供給されるアル
ゴンガスが、窒素ガス供給源から第２減圧弁、第
２流量計、第２流量調節弁、及び流体混合部を通
つて供給される窒素ガスに徐々におきかえられる
ように構成すると共に、前記プラズマトーチに巻
回された高周波誘導コイルに高周波電流を供給す
る高周波電源内で前記おきかえに対応させてイン
ピーダンスの整合が行われるように構成したこと
を特徴とする高周波誘導結合プラズマ質量分析計
。 (2) 前記プラズマトーチは、流量調節された第
１〜第３の圧縮ガスが夫々導かれる最外室、外室
、及び内室を有する三重管構造のプラズマトーチ
でなる実用新案登録請求範囲第(1)項記載の高周
波誘導結合プラズマ質量分析計。[Claims for Utility Model Registration] (1) Ions produced by exciting a sample using high-frequency inductively coupled plasma are introduced into a vacuum, guided through an ion optical system to a mass spectrometer detector, and detected. In an analyzer for analyzing elements to be measured, a plasma torch having a triple tube structure that generates the high-frequency inductively coupled plasma is connected from an argon gas supply source to a first pressure reducing valve, a first flow meter, a first flow rate regulating valve, and a fluid. Argon gas supplied through the mixing section is gradually replaced by nitrogen gas supplied from a nitrogen gas source through the second pressure reducing valve, the second flow meter, the second flow control valve, and the fluid mixing section. The high frequency induction is characterized in that it is configured as follows, and that impedance matching is performed in correspondence with the replacement within a high frequency power source that supplies high frequency current to the high frequency induction coil wound around the plasma torch. Coupled plasma mass spectrometer. (2) The plasma torch is a plasma torch with a triple tube structure having an outermost chamber, an outer chamber, and an inner chamber into which first to third compressed gases whose flow rates are adjusted are introduced, respectively. The high frequency inductively coupled plasma mass spectrometer described in (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11797887U JPH0518845Y2 (en) | 1987-07-31 | 1987-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11797887U JPH0518845Y2 (en) | 1987-07-31 | 1987-07-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6423868U true JPS6423868U (en) | 1989-02-08 |
| JPH0518845Y2 JPH0518845Y2 (en) | 1993-05-19 |
Family
ID=31361924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11797887U Expired - Lifetime JPH0518845Y2 (en) | 1987-07-31 | 1987-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0518845Y2 (en) |
-
1987
- 1987-07-31 JP JP11797887U patent/JPH0518845Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0518845Y2 (en) | 1993-05-19 |
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