JPS6423867U - - Google Patents
Info
- Publication number
- JPS6423867U JPS6423867U JP11797787U JP11797787U JPS6423867U JP S6423867 U JPS6423867 U JP S6423867U JP 11797787 U JP11797787 U JP 11797787U JP 11797787 U JP11797787 U JP 11797787U JP S6423867 U JPS6423867 U JP S6423867U
- Authority
- JP
- Japan
- Prior art keywords
- compressed air
- plasma
- inductively coupled
- mass spectrometer
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 4
- 238000009616 inductively coupled plasma Methods 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims 2
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 230000001939 inductive effect Effects 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案実施例の構成説明図、第２図は
従来例の構成説明図、第３図及び第４図はスペク
トル図である。
１……プラズマトーチ、３，３′……アルゴン
ガス供給源、７……高周波誘導結合プラズマ、８
……ノズル、９……スキマー、１１……フオアチ
ヤンバー、１３……センターチヤンバー、１６…
…マスフイルタ、１７……リアチヤンバー、２０
……信号処理部、２１……圧縮空気供給源、２２
ａ〜２２ｃ……減圧弁、２３ａ〜２３ｃ……流量
計、２４ａ〜２４ｃ……流量調節弁、２５……流
体分流部、２６……流体混合部。
FIG. 1 is an explanatory diagram of the configuration of an embodiment of the present invention, FIG. 2 is an explanatory diagram of the configuration of a conventional example, and FIGS. 3 and 4 are spectrum diagrams. 1... Plasma torch, 3,3'... Argon gas supply source, 7... High frequency inductively coupled plasma, 8
... Nozzle, 9 ... Skimmer, 11 ... Front chamber, 13 ... Center chamber, 16 ...
...Mass filter, 17...Rear chamber, 20
... Signal processing section, 21 ... Compressed air supply source, 22
a to 22c...pressure reducing valve, 23a to 23c...flow meter, 24a to 24c...flow control valve, 25...fluid distribution section, 26...fluid mixing section.
Claims (1)
起し生じたイオンを真空中に導入しイオン光学系
を通して質量分析計検出器に導いて検出すること
により前記試料中の被測定元素を分析する分析計
において、前記高周波誘導結合プラズマを生じさ
せる三重管構造のプラズマトーチの最外室へ、ア
ルゴンガス供給源から減圧弁、流量計、流量調節
弁、及び流体混合部を通つて供給されるアルゴン
ガスが、圧縮空気供給源から減圧弁、流量計、及
び流量調節弁を通つて供給される圧縮空気に徐々
におきかえられるように構成したことを特徴とす
る高周波誘導結合プラズマ質量分析計。 (2) 前記プラズマトーチは、流量調節された第
１〜第３の圧縮ガスが夫々導かれる最外室、外室
、及び内室を有する三重管構造のプラズマトーチ
でなる実用新案登録請求範囲第(1)項記載の高周
波誘導結合プラズマ質量分析計。[Claims for Utility Model Registration] (1) Ions produced by exciting a sample using high-frequency inductively coupled plasma are introduced into a vacuum, guided to a mass spectrometer detector through an ion optical system, and detected. In an analyzer for analyzing elements to be measured, a pressure reducing valve, a flow meter, a flow rate control valve, and a fluid mixing section are connected from an argon gas supply source to the outermost chamber of a plasma torch with a triple tube structure that generates the high frequency inductively coupled plasma. A high-frequency inductive coupling characterized in that the argon gas supplied through the compressed air source is gradually replaced by compressed air supplied through the pressure reducing valve, the flow meter, and the flow control valve from a compressed air supply source. Plasma mass spectrometer. (2) The plasma torch is a triple tube structure plasma torch having an outermost chamber, an outer chamber, and an inner chamber through which first to third compressed gases whose flow rates are adjusted are introduced, respectively. The high frequency inductively coupled plasma mass spectrometer described in (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11797787U JPH0615392Y2 (en) | 1987-07-31 | 1987-07-31 | High frequency inductively coupled plasma mass spectrometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11797787U JPH0615392Y2 (en) | 1987-07-31 | 1987-07-31 | High frequency inductively coupled plasma mass spectrometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6423867U true JPS6423867U (en) | 1989-02-08 |
| JPH0615392Y2 JPH0615392Y2 (en) | 1994-04-20 |
Family
ID=31361922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11797787U Expired - Lifetime JPH0615392Y2 (en) | 1987-07-31 | 1987-07-31 | High frequency inductively coupled plasma mass spectrometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0615392Y2 (en) |
-
1987
- 1987-07-31 JP JP11797787U patent/JPH0615392Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0615392Y2 (en) | 1994-04-20 |
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