JPS6426832U - - Google Patents
Info
- Publication number
- JPS6426832U JPS6426832U JP12125987U JP12125987U JPS6426832U JP S6426832 U JPS6426832 U JP S6426832U JP 12125987 U JP12125987 U JP 12125987U JP 12125987 U JP12125987 U JP 12125987U JP S6426832 U JPS6426832 U JP S6426832U
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- pump
- gas phase
- reduced
- pump system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010926 purge Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000012808 vapor phase Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
2……反応炉、3……パージガス、10……タ
ーボ分子ポンプ(第1のポンプ)、11……エグ
ゼクタポンプ(第2のポンプ)。
2... Reactor, 3... Purge gas, 10... Turbomolecular pump (first pump), 11... Executor pump (second pump).
補正 昭62.10.22 図面の簡単な説明を次のように補正する。Correction: 1986.10.22 The brief description of the drawing has been amended as follows.
【図面の簡単な説明】
第1図は、本考案の減圧気相処理装置の一実施
例の構成を示す概略図、第2図は、従来の減圧気
相処理装置の一例の構成を示す概略図、第3図は
、従来の減圧気相処理装置の他の一例の構成を示
す概略図である。
2……反応炉、3……パージガス、10……タ
ーボ分子ポンプ(第1のポンプ)、11……エグ
ゼクタポンプ(第2のポンプ)。[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a schematic diagram showing the configuration of an embodiment of the reduced pressure vapor phase treatment apparatus of the present invention, and FIG. 2 is a schematic diagram showing the configuration of an example of the conventional reduced pressure gas phase treatment apparatus. 3 are schematic diagrams showing the configuration of another example of a conventional reduced pressure vapor phase treatment apparatus. 2... Reactor, 3... Purge gas, 10... Turbomolecular pump (first pump), 11... Executor pump (second pump).
Claims (1)
いて、 前記ポンプシステムを、少なくともほぼ大気圧
から反応炉内の圧力より低い圧力まで減圧を行う
第1のポンプと、 パージガスを合流させる第2のポンプとを直列
に接続して構成したことを特徴とする減圧気相処
理装置。[Claims for Utility Model Registration] A reduced pressure gas phase treatment apparatus equipped with a pump system, comprising: a first pump that reduces the pressure of the pump system from at least approximately atmospheric pressure to a pressure lower than the pressure within the reactor; and a purge gas. A reduced-pressure gas phase processing apparatus characterized in that it is configured by connecting in series a second pump for merging.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987121259U JPH0729626Y2 (en) | 1987-08-07 | 1987-08-07 | Reduced pressure gas phase treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987121259U JPH0729626Y2 (en) | 1987-08-07 | 1987-08-07 | Reduced pressure gas phase treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6426832U true JPS6426832U (en) | 1989-02-15 |
| JPH0729626Y2 JPH0729626Y2 (en) | 1995-07-05 |
Family
ID=31368104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987121259U Expired - Lifetime JPH0729626Y2 (en) | 1987-08-07 | 1987-08-07 | Reduced pressure gas phase treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0729626Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04194233A (en) * | 1990-11-28 | 1992-07-14 | Fujimi Shizai Kk | Seedling and plantng work on retaining wall |
| JPH0754427A (en) * | 1992-04-28 | 1995-02-28 | Hokushiyou Kensetsu:Kk | Construction method of wall and device thereof |
| JPH10220832A (en) * | 1997-02-03 | 1998-08-21 | Mitsubishi Heavy Ind Ltd | Safety device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62280366A (en) * | 1986-05-30 | 1987-12-05 | Hitachi Ltd | Decompression chemical vapor phase deposition device |
-
1987
- 1987-08-07 JP JP1987121259U patent/JPH0729626Y2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62280366A (en) * | 1986-05-30 | 1987-12-05 | Hitachi Ltd | Decompression chemical vapor phase deposition device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04194233A (en) * | 1990-11-28 | 1992-07-14 | Fujimi Shizai Kk | Seedling and plantng work on retaining wall |
| JPH0754427A (en) * | 1992-04-28 | 1995-02-28 | Hokushiyou Kensetsu:Kk | Construction method of wall and device thereof |
| JPH10220832A (en) * | 1997-02-03 | 1998-08-21 | Mitsubishi Heavy Ind Ltd | Safety device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0729626Y2 (en) | 1995-07-05 |
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