JPS642861A - Polishing device - Google Patents
Polishing deviceInfo
- Publication number
- JPS642861A JPS642861A JP62130088A JP13008887A JPS642861A JP S642861 A JPS642861 A JP S642861A JP 62130088 A JP62130088 A JP 62130088A JP 13008887 A JP13008887 A JP 13008887A JP S642861 A JPS642861 A JP S642861A
- Authority
- JP
- Japan
- Prior art keywords
- reverse
- obverse
- workpiece
- carrier
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title abstract 5
- 230000002093 peripheral effect Effects 0.000 abstract 2
- 239000003082 abrasive agent Substances 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 239000004744 fabric Substances 0.000 abstract 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62130088A JPS642861A (en) | 1987-03-30 | 1987-05-27 | Polishing device |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-74448 | 1987-03-30 | ||
| JP7444887 | 1987-03-30 | ||
| JP62130088A JPS642861A (en) | 1987-03-30 | 1987-05-27 | Polishing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH012861A JPH012861A (ja) | 1989-01-06 |
| JPS642861A true JPS642861A (en) | 1989-01-06 |
Family
ID=26415602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62130088A Pending JPS642861A (en) | 1987-03-30 | 1987-05-27 | Polishing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS642861A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0425376A (ja) * | 1990-05-16 | 1992-01-29 | Showa Alum Corp | 研磨装置 |
| US7455785B2 (en) | 2002-03-29 | 2008-11-25 | Hoya Corporation | Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus |
| JP2010099830A (ja) * | 2008-10-22 | 2010-05-06 | Siltronic Ag | 平坦なワークピースを両面加工する装置、ならびに複数の半導体ウェハを両面で同時に材料切削加工する方法 |
-
1987
- 1987-05-27 JP JP62130088A patent/JPS642861A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0425376A (ja) * | 1990-05-16 | 1992-01-29 | Showa Alum Corp | 研磨装置 |
| US7455785B2 (en) | 2002-03-29 | 2008-11-25 | Hoya Corporation | Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus |
| JP2010099830A (ja) * | 2008-10-22 | 2010-05-06 | Siltronic Ag | 平坦なワークピースを両面加工する装置、ならびに複数の半導体ウェハを両面で同時に材料切削加工する方法 |
| US8512099B2 (en) | 2008-10-22 | 2013-08-20 | Siltronic Ag | Method for the simultaneous double-sided material removal processing of a plurality of semiconductor wafers |
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