JPS6431410A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number: JPS6431410A
Authority: JP; Japan
Prior art keywords: substrate; plane; reevaporation; plane orientation; epitaxial growth
Prior art date: 1987-07-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP18864587A

Other languages

English (en)

Other versions

JP2708156B2 (ja

Inventor

Toshiro Hayakawa

Naohiro Suyama

Kousei Takahashi

Masafumi Kondo

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Sharp Corp

Original Assignee

Sharp Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-07-27

Filing date

1987-07-27

Publication date

1989-02-01

1987-07-27 Application filed by Sharp Corp filed Critical Sharp Corp

1987-07-27 Priority to JP62188645A priority Critical patent/JP2708156B2/ja

1989-02-01 Publication of JPS6431410A publication Critical patent/JPS6431410A/ja

1998-02-04 Application granted granted Critical

1998-02-04 Publication of JP2708156B2 publication Critical patent/JP2708156B2/ja

2013-02-04 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

239000004065 semiconductor Substances 0.000 title abstract 4
239000000758 substrate Substances 0.000 abstract 6
150000001875 compounds Chemical class 0.000 abstract 2

Landscapes

Recrystallisation Techniques (AREA)
Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

JP62188645A 1987-07-27 1987-07-27 半導体装置の製造方法 Expired - Fee Related JP2708156B2 (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP62188645A JP2708156B2 (ja)	1987-07-27	1987-07-27	半導体装置の製造方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP62188645A JP2708156B2 (ja)	1987-07-27	1987-07-27	半導体装置の製造方法

Publications (2)

Publication Number	Publication Date
JPS6431410A true JPS6431410A (en)	1989-02-01
JP2708156B2 JP2708156B2 (ja)	1998-02-04

Family

ID=16227341

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP62188645A Expired - Fee Related JP2708156B2 (ja)	1987-07-27	1987-07-27	半導体装置の製造方法

Country Status (1)

Country	Link
JP (1)	JP2708156B2 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6148247A (ja) *	1984-08-16	1986-03-08	Nec Corp	デ−タ転送方式の異常検出方式
JPS6288318A (ja) *	1985-10-14	1987-04-22	Sharp Corp	半導体装置の製造方法

1987
- 1987-07-27 JP JP62188645A patent/JP2708156B2/ja not_active Expired - Fee Related

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6148247A (ja) *	1984-08-16	1986-03-08	Nec Corp	デ−タ転送方式の異常検出方式
JPS6288318A (ja) *	1985-10-14	1987-04-22	Sharp Corp	半導体装置の製造方法

Also Published As

Publication number	Publication date
JP2708156B2 (ja)	1998-02-04

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Legal Events

Date	Code	Title	Description
2006-10-17	LAPS	Cancellation because of no payment of annual fees