JPS6431421A - Microwave plasma treatment device - Google Patents

Microwave plasma treatment device

Info

Publication number
JPS6431421A
JPS6431421A JP62187338A JP18733887A JPS6431421A JP S6431421 A JPS6431421 A JP S6431421A JP 62187338 A JP62187338 A JP 62187338A JP 18733887 A JP18733887 A JP 18733887A JP S6431421 A JPS6431421 A JP S6431421A
Authority
JP
Japan
Prior art keywords
plasma
plasma chamber
high frequency
power source
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62187338A
Other languages
English (en)
Inventor
Sumio Mori
Masami Sasaki
Kiyoushiyoku Kin
Seitaro Matsuo
Chiharu Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Anelva Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP62187338A priority Critical patent/JPS6431421A/ja
Publication of JPS6431421A publication Critical patent/JPS6431421A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
  • ing And Chemical Polishing (AREA)
  • Structure Of Printed Boards (AREA)
  • Drying Of Semiconductors (AREA)
JP62187338A 1987-07-27 1987-07-27 Microwave plasma treatment device Pending JPS6431421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62187338A JPS6431421A (en) 1987-07-27 1987-07-27 Microwave plasma treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62187338A JPS6431421A (en) 1987-07-27 1987-07-27 Microwave plasma treatment device

Publications (1)

Publication Number Publication Date
JPS6431421A true JPS6431421A (en) 1989-02-01

Family

ID=16204251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62187338A Pending JPS6431421A (en) 1987-07-27 1987-07-27 Microwave plasma treatment device

Country Status (1)

Country Link
JP (1) JPS6431421A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04235283A (ja) * 1990-12-31 1992-08-24 Semiconductor Energy Lab Co Ltd 被膜形成装置及び被膜形成方法
JPH0544041A (ja) * 1990-12-12 1993-02-23 Semiconductor Energy Lab Co Ltd 被膜形成装置及び被膜形成方法
CN103269557A (zh) * 2013-04-28 2013-08-28 大连民族学院 一种射频离子源

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0544041A (ja) * 1990-12-12 1993-02-23 Semiconductor Energy Lab Co Ltd 被膜形成装置及び被膜形成方法
JPH04235283A (ja) * 1990-12-31 1992-08-24 Semiconductor Energy Lab Co Ltd 被膜形成装置及び被膜形成方法
CN103269557A (zh) * 2013-04-28 2013-08-28 大连民族学院 一种射频离子源

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