JPS64323B2 - - Google Patents
Info
- Publication number
- JPS64323B2 JPS64323B2 JP58124163A JP12416383A JPS64323B2 JP S64323 B2 JPS64323 B2 JP S64323B2 JP 58124163 A JP58124163 A JP 58124163A JP 12416383 A JP12416383 A JP 12416383A JP S64323 B2 JPS64323 B2 JP S64323B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- substrate
- film
- gas
- methylhydrodiene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58124163A JPS6016810A (ja) | 1983-07-08 | 1983-07-08 | 表面被覆膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58124163A JPS6016810A (ja) | 1983-07-08 | 1983-07-08 | 表面被覆膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6016810A JPS6016810A (ja) | 1985-01-28 |
| JPS64323B2 true JPS64323B2 (da) | 1989-01-06 |
Family
ID=14878499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58124163A Granted JPS6016810A (ja) | 1983-07-08 | 1983-07-08 | 表面被覆膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6016810A (da) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5041303A (en) * | 1988-03-07 | 1991-08-20 | Polyplasma Incorporated | Process for modifying large polymeric surfaces |
| JP2932604B2 (ja) * | 1990-05-15 | 1999-08-09 | 東亞合成株式会社 | 炭化珪素膜を有する物品の製造方法 |
| GB0509648D0 (en) * | 2005-05-12 | 2005-06-15 | Dow Corning Ireland Ltd | Plasma system to deposit adhesion primer layers |
-
1983
- 1983-07-08 JP JP58124163A patent/JPS6016810A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6016810A (ja) | 1985-01-28 |
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