JPS6435545A - Resist composition used for processing with charged particle beam - Google Patents
Resist composition used for processing with charged particle beamInfo
- Publication number
- JPS6435545A JPS6435545A JP19232687A JP19232687A JPS6435545A JP S6435545 A JPS6435545 A JP S6435545A JP 19232687 A JP19232687 A JP 19232687A JP 19232687 A JP19232687 A JP 19232687A JP S6435545 A JPS6435545 A JP S6435545A
- Authority
- JP
- Japan
- Prior art keywords
- compd
- org
- radiation
- ionic
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 title 1
- 230000005855 radiation Effects 0.000 abstract 3
- 238000009825 accumulation Methods 0.000 abstract 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- PUAQLLVFLMYYJJ-UHFFFAOYSA-N 2-aminopropiophenone Chemical compound CC(N)C(=O)C1=CC=CC=C1 PUAQLLVFLMYYJJ-UHFFFAOYSA-N 0.000 abstract 1
- 150000003863 ammonium salts Chemical class 0.000 abstract 1
- 239000000981 basic dye Substances 0.000 abstract 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 abstract 1
- 238000002156 mixing Methods 0.000 abstract 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 abstract 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 abstract 1
- 150000004032 porphyrins Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19232687A JPS6435545A (en) | 1987-07-31 | 1987-07-31 | Resist composition used for processing with charged particle beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19232687A JPS6435545A (en) | 1987-07-31 | 1987-07-31 | Resist composition used for processing with charged particle beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6435545A true JPS6435545A (en) | 1989-02-06 |
Family
ID=16289425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19232687A Pending JPS6435545A (en) | 1987-07-31 | 1987-07-31 | Resist composition used for processing with charged particle beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6435545A (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH021857A (ja) * | 1987-12-18 | 1990-01-08 | Ucb Sa | 感光性組成物 |
| JPH03278082A (ja) * | 1990-03-27 | 1991-12-09 | Agency Of Ind Science & Technol | ホログラム記録用感光材料 |
| JPH0435578A (ja) * | 1990-05-31 | 1992-02-06 | Fujitsu Ltd | 時間フィルタ装置 |
| JP2016080998A (ja) * | 2014-10-22 | 2016-05-16 | 日本電信電話株式会社 | イオンゲルおよびイオンゲルパターンの作製方法 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4856130A (ja) * | 1971-11-13 | 1973-08-07 | ||
| JPS5627139A (en) * | 1979-08-09 | 1981-03-16 | Ibm | Electronnbeam resist composition |
| JPS5993441A (ja) * | 1982-11-19 | 1984-05-29 | Hitachi Ltd | レジスト |
| JPS6088942A (ja) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS60173545A (ja) * | 1983-11-08 | 1985-09-06 | ヘキスト アクチエンゲゼルシヤフト | 感光性組成物及びネガチブレリ−フコピ−の製法 |
| JPS60191261A (ja) * | 1984-03-13 | 1985-09-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版の製版法 |
| JPS62153950A (ja) * | 1985-12-27 | 1987-07-08 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
| JPS62160441A (ja) * | 1986-01-09 | 1987-07-16 | Hitachi Chem Co Ltd | ホトレジスト用感光性組成物 |
| JPS62161146A (ja) * | 1986-01-10 | 1987-07-17 | Mitsubishi Petrochem Co Ltd | ホトレジスト組成物 |
-
1987
- 1987-07-31 JP JP19232687A patent/JPS6435545A/ja active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4856130A (ja) * | 1971-11-13 | 1973-08-07 | ||
| JPS5627139A (en) * | 1979-08-09 | 1981-03-16 | Ibm | Electronnbeam resist composition |
| JPS5993441A (ja) * | 1982-11-19 | 1984-05-29 | Hitachi Ltd | レジスト |
| JPS6088942A (ja) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS60173545A (ja) * | 1983-11-08 | 1985-09-06 | ヘキスト アクチエンゲゼルシヤフト | 感光性組成物及びネガチブレリ−フコピ−の製法 |
| JPS60191261A (ja) * | 1984-03-13 | 1985-09-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版の製版法 |
| JPS62153950A (ja) * | 1985-12-27 | 1987-07-08 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
| JPS62160441A (ja) * | 1986-01-09 | 1987-07-16 | Hitachi Chem Co Ltd | ホトレジスト用感光性組成物 |
| JPS62161146A (ja) * | 1986-01-10 | 1987-07-17 | Mitsubishi Petrochem Co Ltd | ホトレジスト組成物 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH021857A (ja) * | 1987-12-18 | 1990-01-08 | Ucb Sa | 感光性組成物 |
| JPH03278082A (ja) * | 1990-03-27 | 1991-12-09 | Agency Of Ind Science & Technol | ホログラム記録用感光材料 |
| JPH0435578A (ja) * | 1990-05-31 | 1992-02-06 | Fujitsu Ltd | 時間フィルタ装置 |
| JP2016080998A (ja) * | 2014-10-22 | 2016-05-16 | 日本電信電話株式会社 | イオンゲルおよびイオンゲルパターンの作製方法 |
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