JPS647043A - Photomask - Google Patents

Photomask

Info

Publication number
JPS647043A
JPS647043A JP16422587A JP16422587A JPS647043A JP S647043 A JPS647043 A JP S647043A JP 16422587 A JP16422587 A JP 16422587A JP 16422587 A JP16422587 A JP 16422587A JP S647043 A JPS647043 A JP S647043A
Authority
JP
Japan
Prior art keywords
pattern
interval
width
equal
variance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16422587A
Other languages
Japanese (ja)
Other versions
JPH0545948B2 (en
Inventor
Akihiro Hosoya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP16422587A priority Critical patent/JPS647043A/en
Publication of JPS647043A publication Critical patent/JPS647043A/en
Publication of JPH0545948B2 publication Critical patent/JPH0545948B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To red variance in the size of a formed pattern directly, visually, and accurately by providing a photomask with a fixed-form pattern group which is equal in width and interval and plural pattern groups which are varied in width and interval at a constant rate besides a semiconductor pattern. CONSTITUTION:The fixed-form pattern group 11 which is equal in width and interval and pattern groups 12-14 and 15-17 which are varied in pattern group width and interval are formed. It is assumed that when the pattern groups 11-17 are transferred to a photoresist film on a semiconductor substrate or insulating film on the semiconductor substrate, there is variance in pattern size caused by process variation. At this time, a part where the width and interval of the actual pattern become equal is confirmed by being checked visually through a microscope, etc., and the deviation to the part where the width and interval of the pattern are equal on a mask is measured. Consequently, the variance in pattern size is accurately read.
JP16422587A 1987-06-30 1987-06-30 Photomask Granted JPS647043A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16422587A JPS647043A (en) 1987-06-30 1987-06-30 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16422587A JPS647043A (en) 1987-06-30 1987-06-30 Photomask

Publications (2)

Publication Number Publication Date
JPS647043A true JPS647043A (en) 1989-01-11
JPH0545948B2 JPH0545948B2 (en) 1993-07-12

Family

ID=15789050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16422587A Granted JPS647043A (en) 1987-06-30 1987-06-30 Photomask

Country Status (1)

Country Link
JP (1) JPS647043A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07153802A (en) * 1993-11-30 1995-06-16 Nec Corp Semiconductor device
US8091658B2 (en) 2005-12-29 2012-01-10 Industrial Technology Research Institute Wheel arrangement for a four-wheeled vehicle

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582845A (en) * 1981-06-30 1983-01-08 Toshiba Corp Photomask and pattern evaluating method
JPS5883853A (en) * 1981-11-13 1983-05-19 Nippon Kogaku Kk <Nikon> Mask substrate for check
JPS5960439A (en) * 1982-09-30 1984-04-06 Fujitsu Ltd Photomask

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582845A (en) * 1981-06-30 1983-01-08 Toshiba Corp Photomask and pattern evaluating method
JPS5883853A (en) * 1981-11-13 1983-05-19 Nippon Kogaku Kk <Nikon> Mask substrate for check
JPS5960439A (en) * 1982-09-30 1984-04-06 Fujitsu Ltd Photomask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07153802A (en) * 1993-11-30 1995-06-16 Nec Corp Semiconductor device
US8091658B2 (en) 2005-12-29 2012-01-10 Industrial Technology Research Institute Wheel arrangement for a four-wheeled vehicle

Also Published As

Publication number Publication date
JPH0545948B2 (en) 1993-07-12

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